Integrated optical beam splitters employing symmetric mode mixing in SiO2/SiON/SiO2 multimode interference waveguides

Ricky W. Chuang, Zhen Liang Liao, Chih Kai Chang

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7 Citations (Scopus)

Abstract

A collection of SiON films with different chemical compositions (various O/N ratios) were deposited on silicon substrates using plasma-enhanced chemical vapor deposition (PECVD). These films were then optically characterized to delineate the impacts of relevant film growth parameters to the corresponding refractive indices and infrared absorption spectra. The refractive indices of SiON films with different O/N ratios spanned from 1.47 to 1.93 were realized by judiciously adjusting the pertinent PECVD gas flow rates. Next, the integrated 1-to-8 and 1-to-16 multimode interference (MMI) power beam splitters were designed and fabricated based on the numerical simulation using beam propagation method (BPM). The normalized light intensities varied from ∼0.92 to 1 and from ∼0.88 to 1 for symmetrical 1 × 8 and 1 × 16 devices, which correspond to the maximum power imbalances of 0.38 and 0.56 dB, respectively. Finally, the ramification of varying the width of multimode waveguide section was also investigated numerically using BPM tecnnique.

Original languageEnglish
Pages (from-to)2440-2444
Number of pages5
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume46
Issue number4 B
DOIs
Publication statusPublished - 2007 Apr 24

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Optical beam splitters
beam splitters
Beam propagation method
Waveguides
Plasma enhanced chemical vapor deposition
waveguides
interference
Refractive index
Infrared absorption
vapor deposition
Film growth
refractivity
Flow of gases
propagation
Absorption spectra
Flow rate
luminous intensity
infrared absorption
gas flow
Silicon

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

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title = "Integrated optical beam splitters employing symmetric mode mixing in SiO2/SiON/SiO2 multimode interference waveguides",
abstract = "A collection of SiON films with different chemical compositions (various O/N ratios) were deposited on silicon substrates using plasma-enhanced chemical vapor deposition (PECVD). These films were then optically characterized to delineate the impacts of relevant film growth parameters to the corresponding refractive indices and infrared absorption spectra. The refractive indices of SiON films with different O/N ratios spanned from 1.47 to 1.93 were realized by judiciously adjusting the pertinent PECVD gas flow rates. Next, the integrated 1-to-8 and 1-to-16 multimode interference (MMI) power beam splitters were designed and fabricated based on the numerical simulation using beam propagation method (BPM). The normalized light intensities varied from ∼0.92 to 1 and from ∼0.88 to 1 for symmetrical 1 × 8 and 1 × 16 devices, which correspond to the maximum power imbalances of 0.38 and 0.56 dB, respectively. Finally, the ramification of varying the width of multimode waveguide section was also investigated numerically using BPM tecnnique.",
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N2 - A collection of SiON films with different chemical compositions (various O/N ratios) were deposited on silicon substrates using plasma-enhanced chemical vapor deposition (PECVD). These films were then optically characterized to delineate the impacts of relevant film growth parameters to the corresponding refractive indices and infrared absorption spectra. The refractive indices of SiON films with different O/N ratios spanned from 1.47 to 1.93 were realized by judiciously adjusting the pertinent PECVD gas flow rates. Next, the integrated 1-to-8 and 1-to-16 multimode interference (MMI) power beam splitters were designed and fabricated based on the numerical simulation using beam propagation method (BPM). The normalized light intensities varied from ∼0.92 to 1 and from ∼0.88 to 1 for symmetrical 1 × 8 and 1 × 16 devices, which correspond to the maximum power imbalances of 0.38 and 0.56 dB, respectively. Finally, the ramification of varying the width of multimode waveguide section was also investigated numerically using BPM tecnnique.

AB - A collection of SiON films with different chemical compositions (various O/N ratios) were deposited on silicon substrates using plasma-enhanced chemical vapor deposition (PECVD). These films were then optically characterized to delineate the impacts of relevant film growth parameters to the corresponding refractive indices and infrared absorption spectra. The refractive indices of SiON films with different O/N ratios spanned from 1.47 to 1.93 were realized by judiciously adjusting the pertinent PECVD gas flow rates. Next, the integrated 1-to-8 and 1-to-16 multimode interference (MMI) power beam splitters were designed and fabricated based on the numerical simulation using beam propagation method (BPM). The normalized light intensities varied from ∼0.92 to 1 and from ∼0.88 to 1 for symmetrical 1 × 8 and 1 × 16 devices, which correspond to the maximum power imbalances of 0.38 and 0.56 dB, respectively. Finally, the ramification of varying the width of multimode waveguide section was also investigated numerically using BPM tecnnique.

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