Abstract
A collection of SiON films with different chemical compositions (various O/N ratios) were deposited on silicon substrates using plasma-enhanced chemical vapor deposition (PECVD). These films were then optically characterized to delineate the impacts of relevant film growth parameters to the corresponding refractive indices and infrared absorption spectra. The refractive indices of SiON films with different O/N ratios spanned from 1.47 to 1.93 were realized by judiciously adjusting the pertinent PECVD gas flow rates. Next, the integrated 1-to-8 and 1-to-16 multimode interference (MMI) power beam splitters were designed and fabricated based on the numerical simulation using beam propagation method (BPM). The normalized light intensities varied from ∼0.92 to 1 and from ∼0.88 to 1 for symmetrical 1 × 8 and 1 × 16 devices, which correspond to the maximum power imbalances of 0.38 and 0.56 dB, respectively. Finally, the ramification of varying the width of multimode waveguide section was also investigated numerically using BPM tecnnique.
| Original language | English |
|---|---|
| Pages (from-to) | 2440-2444 |
| Number of pages | 5 |
| Journal | Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers |
| Volume | 46 |
| Issue number | 4 B |
| DOIs | |
| Publication status | Published - 2007 Apr 24 |
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All Science Journal Classification (ASJC) codes
- Engineering(all)
- Physics and Astronomy(all)
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Integrated optical beam splitters employing symmetric mode mixing in SiO2/SiON/SiO2 multimode interference waveguides. / Chuang, Ricky W.; Liao, Zhen Liang; Chang, Chih Kai.
In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, Vol. 46, No. 4 B, 24.04.2007, p. 2440-2444.Research output: Contribution to journal › Article
TY - JOUR
T1 - Integrated optical beam splitters employing symmetric mode mixing in SiO2/SiON/SiO2 multimode interference waveguides
AU - Chuang, Ricky W.
AU - Liao, Zhen Liang
AU - Chang, Chih Kai
PY - 2007/4/24
Y1 - 2007/4/24
N2 - A collection of SiON films with different chemical compositions (various O/N ratios) were deposited on silicon substrates using plasma-enhanced chemical vapor deposition (PECVD). These films were then optically characterized to delineate the impacts of relevant film growth parameters to the corresponding refractive indices and infrared absorption spectra. The refractive indices of SiON films with different O/N ratios spanned from 1.47 to 1.93 were realized by judiciously adjusting the pertinent PECVD gas flow rates. Next, the integrated 1-to-8 and 1-to-16 multimode interference (MMI) power beam splitters were designed and fabricated based on the numerical simulation using beam propagation method (BPM). The normalized light intensities varied from ∼0.92 to 1 and from ∼0.88 to 1 for symmetrical 1 × 8 and 1 × 16 devices, which correspond to the maximum power imbalances of 0.38 and 0.56 dB, respectively. Finally, the ramification of varying the width of multimode waveguide section was also investigated numerically using BPM tecnnique.
AB - A collection of SiON films with different chemical compositions (various O/N ratios) were deposited on silicon substrates using plasma-enhanced chemical vapor deposition (PECVD). These films were then optically characterized to delineate the impacts of relevant film growth parameters to the corresponding refractive indices and infrared absorption spectra. The refractive indices of SiON films with different O/N ratios spanned from 1.47 to 1.93 were realized by judiciously adjusting the pertinent PECVD gas flow rates. Next, the integrated 1-to-8 and 1-to-16 multimode interference (MMI) power beam splitters were designed and fabricated based on the numerical simulation using beam propagation method (BPM). The normalized light intensities varied from ∼0.92 to 1 and from ∼0.88 to 1 for symmetrical 1 × 8 and 1 × 16 devices, which correspond to the maximum power imbalances of 0.38 and 0.56 dB, respectively. Finally, the ramification of varying the width of multimode waveguide section was also investigated numerically using BPM tecnnique.
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U2 - 10.1143/JJAP.46.2440
DO - 10.1143/JJAP.46.2440
M3 - Article
AN - SCOPUS:34547888773
VL - 46
SP - 2440
EP - 2444
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
SN - 0021-4922
IS - 4 B
ER -