Internal stress and adhesive strength of reactive magnetron sputtered indium tin oxide films on acrylics

Ding Fwu Lii, Bao Shun Yau, Jow Lay Huang, Ching Yun Chen, Wen Tse Lo

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)

Abstract

Indium tin oxide (ITO) films were deposited on acrylics by low temperature reactive magnetron sputtering. The effects of oxygen flow and film thickness on the internal stress and adhesion of ITO films on acrylics were evaluated. Results from the measurement of lattice parameters suggested that the internal compressive stress parallel to the film surface increased with increasing oxygen flow rate. This was possibly due to the peening effects of bombarding particles and the decrease in oxygen vacancies at relatively high oxygen flow. Observation of scratched surface after adhesion test showed that tensile bending moments occur within the coating as it was pushed down underneath the adhesion test indenter. The critical scratching load of ITO films invariably increased with oxygen flow and decreased with increasing thickness.

Original languageEnglish
Pages (from-to)9-11
Number of pages3
JournalNippon Seramikkusu Kyokai Gakujutsu Ronbunshi/Journal of the Ceramic Society of Japan
Volume109
Issue number1265
DOIs
Publication statusPublished - 2001 Dec 8

All Science Journal Classification (ASJC) codes

  • Ceramics and Composites
  • Chemistry(all)
  • Condensed Matter Physics
  • Materials Chemistry

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