Investigation of Different Oxygen Partial Pressures on MgGa2O4-Resistive Random-Access Memory

Yu Neng Kao, Wei Lun Huang, Sheng Po Chang, Wei Chih Lai, Shoou Jinn Chang

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)


Different oxygen partial-pressure MgGa2O4-resistive RAMs (RRAMs) are fabricated to investigate the resistive switching behaviors. The X-ray photoelectron spectroscopy results, set voltage, reset voltage, cycling endurance, and retention time are drawn for comparison. With the increasing oxygen ratio gas flow, the resistive switching characteristics of MgGa2O4 RRAM are drastically elevated by changing the fabrication conditions of the RS layer. Moreover, we portray a filament model to explain the most likely mechanism associated with the generation and rupture of conductive filaments composed of oxygen vacancies. The formation of the interfacial layer (AlOx) and the participation of the Joule heating effect are included to explain the highly distributed high-resistance state (HRS). The high randomness among switching cycles for memory application should be prevented, but it is suitable for the physical unclonable function. The relationship between HRS and the next time set voltage shows a strong correlation, and the conduction mechanisms of the low-resistance state (LRS) and HRS correspond to ohmic conduction and space charge-limited conduction, respectively. Meanwhile, the RRAM undergoes 10,000 s retention tests, and the two resistance states can be distinguished without obvious alternation or degradation. A favorable cycling endurance and retention time achieved by optimizing the fabrication parameters of Al/MgGa2O4/Pt RRAM have the potential for nonvolatile memristors and information security applications.

Original languageEnglish
JournalACS Omega
Publication statusAccepted/In press - 2022

All Science Journal Classification (ASJC) codes

  • General Chemistry
  • General Chemical Engineering


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