Investigation of low-cost surface processing techniques for large-size multicrystalline silicon solar cells

Jyh Jier Ho, Yuang Tung Cheng, William J. Lee, Song Yeu Tsai, Yung An Lu, Jia Jhe Liou, Shun Hsyung Chang, Kang L. Wang

Research output: Contribution to journalArticlepeer-review

15 Citations (Scopus)


The subject of the present work is to develop a simple and effective method of enhancing conversion efficiency in large-size solar cells using multicrystalline silicon (mc-Si) wafer. In this work, industrial-type mc-Si solar cells with area of 125 × 125 mm2 were acid etched to produce simultaneously POCl3 emitters and silicon nitride deposition by plasma-enhanced chemical vapor deposited (PECVD). The study of surface morphology and reflectivity of different mc-Si etched surfaces has also been discussed in this research. Using our optimal acid etching solution ratio, we are able to fabricate mc-Si solar cells of 16.34 conversion efficiency with double layers silicon nitride (Si3N4) coating. From our experiment, we find that depositing double layers silicon nitride coating on mc-Si solar cells can get the optimal performance parameters. Open circuit (Voc) is 616mV, short circuit current (Jsc) is 34.1mA/cm2, and minority carrier diffusion length is 474.16 μm. The isotropic texturing and silicon nitride layers coating approach contribute to lowering cost and achieving high efficiency in mass production.

Original languageEnglish
Article number268035
JournalInternational Journal of Photoenergy
Publication statusPublished - 2010

All Science Journal Classification (ASJC) codes

  • General Chemistry
  • Atomic and Molecular Physics, and Optics
  • Renewable Energy, Sustainability and the Environment
  • General Materials Science


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