Abstract
The influences for mesa-sidewall effects of GaInP/InGaAs/GaInP pseudomorphic high electron mobility transistors are investigated. The device characteristics are degraded because of the mesa-sidewall effects of gate leakage current path. When the number of mesa sidewall is increased then the excessive gate leakage current, reduced breakdown voltage and transconductance and variation of threshold voltage is found to take place.
Original language | English |
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Pages (from-to) | 2615-2619 |
Number of pages | 5 |
Journal | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures |
Volume | 18 |
Issue number | 6 |
DOIs | |
Publication status | Published - 2000 Nov |
Event | 44th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication - Rancho Mirage, CA, USA Duration: 2000 May 30 → 2000 Jun 2 |
All Science Journal Classification (ASJC) codes
- Condensed Matter Physics
- Electrical and Electronic Engineering