Investigation of metallized source/drain extension for high-performance strained NMOSFETs

Tzu Juei Wang, Chih Hsin Ko, Hong Nien Lin, Shoou Jinn Chang, San Lein Wu, Ta Ming Kuan, Wen Chen Lee

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)

Abstract

Extrinsic source/drain series resistance RSD is becoming inevitably dominant in state-of-the-art CMOS technologies as the intrinsic device resistance continues to scale with channel length dictated by the Moore's Law. As a result, advanced scaling techniques to achieve a lower intrinsic device resistance become less effective, particularly for NMOSFETs. With an attempt to better understand RSD impacts and identify the next key technology enabler, high-performance strained NMOSFETs featuring metallized (NiSi) source/ drain extension (M-SDE) are investigated due to its cost-effective process and good short-channel scalability. The spacing between metallized extension and gate electrode edge is shown to play a very important role in RSD reduction and can significantly affect the electrical characteristics of M-SDE NMOSFETs. Tradeoff between RSD reduction and device integrity like junction leakage and reliability is found when the extension-to-gate edge spacing is modulated. On the other hand, by optimizing the NiSi-to-gate edge spacing, M-SDE NMOSFETs exhibit a higher on ION and a higher strain sensitivity while maintaining comparable drain-induced barrier lowering, subthreshold swing, IOFF, and hot-carrier reliability as compared with the conventional SDE devices.

Original languageEnglish
Pages (from-to)3221-3226
Number of pages6
JournalIEEE Transactions on Electron Devices
Volume55
Issue number11
DOIs
Publication statusPublished - 2008

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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