Investigation of nanocrystal-(Ti1-xAlx) Ny/amorphous-Si3N4 nanolaminate films

Bao Shun Yau; Jow Lay Huang; Horng Hwa Lu; Pavol Sajgalik

doi:10.1016/j.surfcoat.2004.05.009

Investigation of nanocrystal-(Ti_1-xAlx) N_y/amorphous-Si₃N₄ nanolaminate films

Bao Shun Yau, Jow Lay Huang, Horng Hwa Lu, Pavol Sajgalik

Research output: Contribution to journal › Article › peer-review

31 Citations (Scopus)

Abstract

Nanocrystal-(Ti_1-xAl_x) N_y/amorphous-Si₃N₄ nanolaminate films were deposited periodically via reactive magnetron sputtering technique. The effects of the thickness of multilayer period on the microstructure and mechanical properties were investigated by X-ray diffraction, scanning and transmission electron microscopies, nanoindentation and scratching adhesion testing. Results indicate that the nanolaminate structure is uniform and good flatness interfaces under different multilayer periods. The nanolaminate films exhibited a maximum hardness when the multilayer structure had a period of λ=25 nm and were harder than monolayer (Ti_1-xAl_x)N_y or Si₃N₄ films of the same thickness. The critical scratching load of the nanolaminates was higher than that of monolayer specimens with the same thickness. The mechanisms of fracture and toughening of nanolaminate films are also discussed.

Original language	English
Pages (from-to)	119-127
Number of pages	9
Journal	Surface and Coatings Technology
Volume	194
Issue number	1
DOIs	https://doi.org/10.1016/j.surfcoat.2004.05.009
Publication status	Published - 2005 Apr 20

All Science Journal Classification (ASJC) codes

Chemistry(all)
Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films
Materials Chemistry

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10.1016/j.surfcoat.2004.05.009

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abstract = "Nanocrystal-(Ti1-xAlx) Ny/amorphous-Si3N4 nanolaminate films were deposited periodically via reactive magnetron sputtering technique. The effects of the thickness of multilayer period on the microstructure and mechanical properties were investigated by X-ray diffraction, scanning and transmission electron microscopies, nanoindentation and scratching adhesion testing. Results indicate that the nanolaminate structure is uniform and good flatness interfaces under different multilayer periods. The nanolaminate films exhibited a maximum hardness when the multilayer structure had a period of λ=25 nm and were harder than monolayer (Ti1-xAlx)Ny or Si3N4 films of the same thickness. The critical scratching load of the nanolaminates was higher than that of monolayer specimens with the same thickness. The mechanisms of fracture and toughening of nanolaminate films are also discussed.",

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AU - Lu, Horng Hwa

AU - Sajgalik, Pavol

PY - 2005/4/20

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AB - Nanocrystal-(Ti1-xAlx) Ny/amorphous-Si3N4 nanolaminate films were deposited periodically via reactive magnetron sputtering technique. The effects of the thickness of multilayer period on the microstructure and mechanical properties were investigated by X-ray diffraction, scanning and transmission electron microscopies, nanoindentation and scratching adhesion testing. Results indicate that the nanolaminate structure is uniform and good flatness interfaces under different multilayer periods. The nanolaminate films exhibited a maximum hardness when the multilayer structure had a period of λ=25 nm and were harder than monolayer (Ti1-xAlx)Ny or Si3N4 films of the same thickness. The critical scratching load of the nanolaminates was higher than that of monolayer specimens with the same thickness. The mechanisms of fracture and toughening of nanolaminate films are also discussed.

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Investigation of nanocrystal-(Ti_1-xAlx) N_y/amorphous-Si₃N₄ nanolaminate films

Abstract

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