Investigation of SimGen strained monolayer superlattices by Rheed, Raman, and X-ray techniques

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Abstract

Ultrathin SimGen strained monolayer superlattices (SMS) have been grown by molecular beam epitaxy. The critical thickness of the total superlattice is determined in situ by direct observation of the changes of surface reconstruction patterns using reflection high energy electron diffraction. Results are in close agreement with that of a single layer with the same thickness and the average SMS composition. Raman scattering and X-ray diffraction spectroscopy are used to study the thermal stability and surface abruptness. Subsequent annealing of these SMSs reveals that the transition from pure silicon and/or germanium layers to Si1-xGex alloys becomes more pronounced as the annealing time and temperature are increased. The interdiffusion coefficients obtained from the X-ray spectrum are found to obey an Arrhenius relation with an activation energy of 3.1 ± 0.2 eV.

Original languageEnglish
Pages (from-to)57-63
Number of pages7
JournalThin Solid Films
Volume183
Issue number1-2
DOIs
Publication statusPublished - 1989 Dec 30

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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