Investigation of the dynamic interaction between dopants and oxygen vacancies in amorphous Nb2O5: Simulation and experimental study

Chia Jung Shih, Meng Hung Tsai, Yu Chen Chen, Yu Ta Chen, Ming Jen Li, Hung Chi Yen, Cheng Liang Huang

Research output: Contribution to journalArticlepeer-review

Abstract

Resistive random-access memory can potentially be used to construct high-speed, low-power, and high-density data-storage drives. Managing oxygen flow at the electrode-oxide interface is vital for improving endurance. Dopant-oxygen interactions govern ion diffusion and vacancy creation. The interactions between multivalent dopants and oxygen vacancies in Nb2O5 have been investigated in previous studies. In this study, we simulated the relationship between a multivalent dopant Mn and oxygen vacancies in amorphous Nb2O5. We introduced oxygen vacancies and Mn ions with different oxidation states to determine the effects of spin densities and band gaps. Experimental results obtained from deposited amorphous thin films validated the simulation results, demonstrating a close agreement between the experimentally obtained (1.11 eV) and predicted bandgaps (0.93 eV). The results of study illuminate the amorphous structure of Nb2O5, the interactions between multivalent Mn dopants and oxygen vacancies, and the resulting electronic properties, offering the potential for designing and optimizing functional materials.

Original languageEnglish
Article number116891
JournalMaterials Science and Engineering: B
Volume298
DOIs
Publication statusPublished - 2023 Dec

All Science Journal Classification (ASJC) codes

  • General Materials Science
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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