Investigation of the growth technique dependence on the optical properties of Si1-xGex alloy layers

V. Arbet-Engels, J. M.G. Tijero, A. Manissadjian, K. L. Wang, V. Higgs

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)

Abstract

The discrepancy between the measured photoluminescence spectra of Si1-xGex strained alloy layers originating from molecular beam epitaxy (MBE) and chemical vapor deposition (CVD) processes is investigated. Sharp excitonic band edge luminescences are observed for films by both growth techniques. For certain films grown by MBE, the photoluminescence spectra contain an additional broad alloy band luminescence at low energy. Deuterium passivation of the MBE layers is shown to annihilate the broad band luminescence and to increase the band edge luminescence intensity. These results are compared with the more intense band edge luminescence signals from CVD layers for which abundant hydrogen radicals are usually present during the deposition.

Original languageEnglish
Pages (from-to)406-410
Number of pages5
JournalJournal of Crystal Growth
Volume127
Issue number1-4
DOIs
Publication statusPublished - 1993 Feb 2

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Inorganic Chemistry
  • Materials Chemistry

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