Investigation of the optical and the electrical characteristics of thin titanium dioxide films

S. L. Tu; Y. H. Su; Y. H. Shen; D. T. Ray; Y. C. Wu; T. H. Chen

doi:10.1179/1432891714Z.000000000594

Investigation of the optical and the electrical characteristics of thin titanium dioxide films

S. L. Tu, Y. H. Su, Y. H. Shen, D. T. Ray, Y. C. Wu, T. H. Chen

Research output: Contribution to journal › Article › peer-review

Abstract

This study dealt with the deposition of nanotitanium films with different thicknesses by using the ultrahigh vacuum ion beam sputtering system. It is found that the thickness of the titanium films was in the nanoscale thus the electric resistivity of the titanium films decreased. Moreover, the deposited titanium was transformed into titanium oxide in an oxygen atmosphere and by using a rapid annealing process. The photoelectronic properties of the nanotitanium thin film was enhanced, when the nanotitanium film was transformed to titanium dioxide.

Original language	English
Pages (from-to)	S26-S30
Journal	Materials Research Innovations
Volume	18
Issue number	SUPPL. 3
DOIs	https://doi.org/10.1179/1432891714Z.000000000594
Publication status	Published - 2014 May

All Science Journal Classification (ASJC) codes

Materials Science(all)
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

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10.1179/1432891714Z.000000000594

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abstract = "This study dealt with the deposition of nanotitanium films with different thicknesses by using the ultrahigh vacuum ion beam sputtering system. It is found that the thickness of the titanium films was in the nanoscale thus the electric resistivity of the titanium films decreased. Moreover, the deposited titanium was transformed into titanium oxide in an oxygen atmosphere and by using a rapid annealing process. The photoelectronic properties of the nanotitanium thin film was enhanced, when the nanotitanium film was transformed to titanium dioxide.",

author = "Tu, {S. L.} and Su, {Y. H.} and Shen, {Y. H.} and Ray, {D. T.} and Wu, {Y. C.} and Chen, {T. H.}",

year = "2014",

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T1 - Investigation of the optical and the electrical characteristics of thin titanium dioxide films

AU - Tu, S. L.

AU - Su, Y. H.

AU - Shen, Y. H.

AU - Ray, D. T.

AU - Wu, Y. C.

AU - Chen, T. H.

PY - 2014/5

Y1 - 2014/5

N2 - This study dealt with the deposition of nanotitanium films with different thicknesses by using the ultrahigh vacuum ion beam sputtering system. It is found that the thickness of the titanium films was in the nanoscale thus the electric resistivity of the titanium films decreased. Moreover, the deposited titanium was transformed into titanium oxide in an oxygen atmosphere and by using a rapid annealing process. The photoelectronic properties of the nanotitanium thin film was enhanced, when the nanotitanium film was transformed to titanium dioxide.

AB - This study dealt with the deposition of nanotitanium films with different thicknesses by using the ultrahigh vacuum ion beam sputtering system. It is found that the thickness of the titanium films was in the nanoscale thus the electric resistivity of the titanium films decreased. Moreover, the deposited titanium was transformed into titanium oxide in an oxygen atmosphere and by using a rapid annealing process. The photoelectronic properties of the nanotitanium thin film was enhanced, when the nanotitanium film was transformed to titanium dioxide.

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JF - Materials Research Innovations

SN - 1432-8917

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Investigation of the optical and the electrical characteristics of thin titanium dioxide films

Abstract

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