Investigation of trap properties in high-k/metal gate p-type metal-oxide-semiconductor field-effect-transistors with aluminum ion implantation using random telegraph noise analysis

Tsung Hsien Kao, Shoou Jinn Chang, Yean Kuen Fang, Po Chin Huang, Chien Ming Lai, Chia Wei Hsu, Yi Wen Chen, Osbert Cheng, Chung Yi Wu, San Lein Wu

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Physics & Astronomy