TY - GEN
T1 - Investigation of ZnO-based ultraviolet light-emitting diodes
AU - Lee, Ching Ting
AU - Chang, Hao Yu
PY - 2014
Y1 - 2014
N2 - Recently, ZnO-based semiconductors have been deposited on various substrates using various methods. Furthermore, they were used in ultraviolet light-emitting diodes (UVLEDs) due to inherent properties including wide direct bandgap and high binding energy. In this work, two different deposition systems were utilized to deposit the ZnO-based films. The resulted films were applied to fabricate the ZnO-based UVLEDs. Firstly, the high quality i-ZnO films were deposited as the active layer by using the vapor cooling condensation system to enhance the internal quantum efficiency. Secondly, the double-heterostructured MgZnO/ZnO/MgZnO layers were deposited as the active layer at low temperature using the vapor cooling condensation system to enhance light intensity. Furthermore, various component ratios of i- MgZnO and i-MgBeZnO films were deposited using a radio frequency (RF) magnetron co-sputter system. Consequently, the deposited films with various energy bandgaps were stacked alternately to form the active layer of multiple-quantum well (MQW) UVLEDs. The light emitting intensity of MQW UVLEDs was better than that of the traditional p-i-n UVLEDs. This phenomenon was attributed to the carrier confinement in well layers and improvement probability of radiative recombination.
AB - Recently, ZnO-based semiconductors have been deposited on various substrates using various methods. Furthermore, they were used in ultraviolet light-emitting diodes (UVLEDs) due to inherent properties including wide direct bandgap and high binding energy. In this work, two different deposition systems were utilized to deposit the ZnO-based films. The resulted films were applied to fabricate the ZnO-based UVLEDs. Firstly, the high quality i-ZnO films were deposited as the active layer by using the vapor cooling condensation system to enhance the internal quantum efficiency. Secondly, the double-heterostructured MgZnO/ZnO/MgZnO layers were deposited as the active layer at low temperature using the vapor cooling condensation system to enhance light intensity. Furthermore, various component ratios of i- MgZnO and i-MgBeZnO films were deposited using a radio frequency (RF) magnetron co-sputter system. Consequently, the deposited films with various energy bandgaps were stacked alternately to form the active layer of multiple-quantum well (MQW) UVLEDs. The light emitting intensity of MQW UVLEDs was better than that of the traditional p-i-n UVLEDs. This phenomenon was attributed to the carrier confinement in well layers and improvement probability of radiative recombination.
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U2 - 10.1117/12.2044343
DO - 10.1117/12.2044343
M3 - Conference contribution
AN - SCOPUS:84901775465
SN - 9780819499004
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - Oxide-Based Materials and Devices V
PB - SPIE
T2 - 5th Annual Oxide Based Materials and Devices Conference
Y2 - 2 February 2014 through 5 February 2014
ER -