Ion-beam-assisted deposition of tin thin films

Hiroshi Kubota, Jen Sue Chen, Elzbieta Kolawa, Marc Aurele Nicolet, Masanori Nagata

Research output: Contribution to journalArticlepeer-review

6 Citations (Scopus)

Abstract

X-ray diffraction and transmission electron analyses are used to investigate changes in the microstructure that occur when TiN films are grown by sequential deposition and irradiation on unheated Si substrates. A N2-Ar gas mixture serves partly for the reactive sputter deposition of TiN from Ti in a rf magnetron target and partly for the generation of a broad ion beam in a Kaufman source. When analyzed in terms of a simple model, the data suggest the existence of a critical growth rate of two Oil) bilayers of TiN per deposition-irradiation cycle. Below that rate, the columnar growth microstructure changes into a granular one with azimuthal texture.

Original languageEnglish
Number of pages1
JournalJapanese Journal of Applied Physics
Volume32
Issue number8 R
DOIs
Publication statusPublished - 1993 Aug

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

Fingerprint Dive into the research topics of 'Ion-beam-assisted deposition of tin thin films'. Together they form a unique fingerprint.

Cite this