Larger surface profile measurement of microstructures by white-light phase-shifting interferometry and image stitching

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

White-light interferometry is very useful for highly resolved 3-D measurements of microscopic structures and micro devices. In this paper, a new stitching approach is developed to extend the measurement area. The characteristics of two neighboring images are enhanced by Laplacian filtering to reduce the effect of non-uniform illumination, and a proper sub-image is chosen based on the standard deviation of the sub-image for image correlation and stitching. Test of the method on the microstructure of a LCD panel shows that good stitching can be achieved within 1 pixel if the standard deviation of the comparing sub-image exceeds 7.1.

Original languageEnglish
Title of host publicationSociety for Experimental Mechanics - SEM Annual Conference and Exposition on Experimental and Applied Mechanics 2009
Pages2382-2386
Number of pages5
Publication statusPublished - 2009 Dec 1
EventSEM Annual Conference and Exposition on Experimental and Applied Mechanics 2009 - Albuquerque, NM, United States
Duration: 2009 Jun 12009 Jun 4

Publication series

NameSociety for Experimental Mechanics - SEM Annual Conference and Exposition on Experimental and Applied Mechanics 2009
Volume4

Other

OtherSEM Annual Conference and Exposition on Experimental and Applied Mechanics 2009
CountryUnited States
CityAlbuquerque, NM
Period09-06-0109-06-04

All Science Journal Classification (ASJC) codes

  • Computational Mechanics

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