Laser-assisted plasma-enhanced chemical vapor deposition of silicon nitride thin film

Engineering & Materials Science

• Plasma enhanced chemical vapor deposition 100%
• Silicon nitride 85%
• Thin films 66%
• Laser beams 60%
• Lasers 53%
• Substrates 37%
• Hydrogen 28%
• Laser beam effects 26%
• Hydrogen bonds 24%
• Amorphous silicon 24%
• Refraction 23%
• Silanes 22%
• Ammonia 18%
• Wavelength 15%
• Corrosion 13%
• Heating 12%
• Temperature 7%

Physics & Astronomy

• silicon nitrides 68%
• vapor deposition 54%
• laser beams 38%
• thin films 36%
• lasers 30%
• irradiation 22%
• flatness 19%
• silanes 19%
• hydrogen bonds 18%
• ammonia 17%
• amorphous silicon 16%
• refraction 15%
• corrosion 15%
• heating 11%
• hydrogen 10%
• wavelengths 8%
• temperature 5%

Chemical Compounds

• Plasma Enhanced Chemical Vapour Deposition 84%
• Nitride 68%
• Liquid Film 34%
• Refraction 18%
• Ammonia 10%
• Corrosion 10%
• Wavelength 10%
• Amorphous Material 9%
• Resistance 8%
• Hydrogen Bond 8%
• Hydrogen 7%
• Amount 6%
• Surface 4%