Laser micromachining of optical devices

Giedrius Kopitkovas, Thomas Lippert, Christian David, Rokas Sulcas, Jonathan Hobley, Alexander Wokaun, Jens Gobrecht

Research output: Contribution to journalConference articlepeer-review

16 Citations (Scopus)


The combination of a gray tone phase mask with a laser assisted wet etching process was applied to fabricate complex microstructures in UV transparent dielectric materials. This one-step method allows the generation of arrays of planoconvex and Fresnel micro-lenses using a conventional XeCl excimer laser and an absorbing liquid, which is in contact with the UV transparent material. An array of plano-convex micro-lenses was tested as beam homogenizer for a high power XeCl excimer and ps Nd:YAG laser. The roughness of the etched features varies from several μm to 10 nm, depending on the laser fluence and concentration of the dye in the organic liquid. The etching process can be divided into several etching mechanisms which vary with laser fluence.

Original languageEnglish
Article number84
Pages (from-to)515-525
Number of pages11
JournalProceedings of SPIE - The International Society for Optical Engineering
Publication statusPublished - 2004
EventFifth International Symposium on Laser Precision Microfabrication - Nara, Japan
Duration: 2004 May 112004 May 14

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering


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