Abstract
An annealing model is extended to treat the vaporization process, and a hydrodynamic model describes the ablated material. We find that dynamic source and ionization effects accelerate the expansion front of the ablated plume with thermal vaporization temperature. The vaporization process and plume propagation in high background gas pressure are studied.
| Original language | English |
|---|---|
| Pages (from-to) | 45-49 |
| Number of pages | 5 |
| Journal | Applied Surface Science |
| Volume | 96-98 |
| DOIs | |
| Publication status | Published - 1996 Apr |
All Science Journal Classification (ASJC) codes
- General Chemistry
- Condensed Matter Physics
- General Physics and Astronomy
- Surfaces and Interfaces
- Surfaces, Coatings and Films
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