Abstract
Vapor-based deposition technique is considered as a promising approach for preparing a high-quality and uniform perovskite thin film. With evolution from coevaporation deposition to a low-pressure vapor-assisted solution process, both energy budget and reaction yield for perovskite film fabrications are improved. In this paper, a low-pressure hybrid chemical vapor deposition (LPHCVD) method is applied to fabricate CH3NH3PbI3 perovskite films. The crucial dependence of working pressure on the perovskite formation is revealed. Moreover, the reaction time plays an important role in controlling the quality of the synthesized perovskite film. Efficient perovskite solar cells of 14.99% (mesoscopic), 15.37% (planar), and perovskite modules (active area of 8.4 cm2) of 6.22% are achieved by this LPHCVD method.
Original language | English |
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Article number | 1500849 |
Journal | Advanced Materials Interfaces |
Volume | 3 |
Issue number | 8 |
DOIs | |
Publication status | Published - 2016 Apr 22 |
All Science Journal Classification (ASJC) codes
- Mechanics of Materials
- Mechanical Engineering