Low-stress transfer of graphene and its tunable resistance by remote plasma treatments in hydrogen

Waileong Chen, Chia Hao Tu, Keng Chih Liang, Chih Yi Liu, Chuan-Pu Liu, Yon-Hua Tzeng

Research output: Chapter in Book/Report/Conference proceedingChapter

Abstract

In this chapter, a novel, low-stress process for transferring thermal chemical vapor deposition (CVD) single-layer graphene from copper foils to destination substrates is demonstrated. An efficient transfer of graphene by directly fishing up the graphene with the target substrate rather than by using the “poly(methyl methacrylate) (PMMA)-based transfer” method is reported. Electrical and optical characteristics of the as-transferred graphene and the hydrogen remote-plasma-modified graphene are presented. Although graphene is mechanically very strong considering its atomically thin structure, a large-area, single-layer graphene is practically very fragile, especially during handling and transfer from one substrate to another. Handling of a large-area freestanding graphene is even more challenging. The combination of effective transfer and surface treatment of graphene by hydrogenation allows the fine-tuning of its electrical resistivity for practical applications.

Original languageEnglish
Title of host publicationNanoelectronic Device Applications Handbook
PublisherCRC Press
Pages365-372
Number of pages8
ISBN (Electronic)9781466565241
ISBN (Print)9781466565234
DOIs
Publication statusPublished - 2017 Jan 1

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Graphene
Plasmas
Hydrogen
Substrates
Polymethyl methacrylates
Metal foil
Hydrogenation
Surface treatment
Chemical vapor deposition
Tuning
Copper

All Science Journal Classification (ASJC) codes

  • Engineering(all)

Cite this

Chen, W., Tu, C. H., Liang, K. C., Liu, C. Y., Liu, C-P., & Tzeng, Y-H. (2017). Low-stress transfer of graphene and its tunable resistance by remote plasma treatments in hydrogen. In Nanoelectronic Device Applications Handbook (pp. 365-372). CRC Press. https://doi.org/10.1201/b15035
Chen, Waileong ; Tu, Chia Hao ; Liang, Keng Chih ; Liu, Chih Yi ; Liu, Chuan-Pu ; Tzeng, Yon-Hua. / Low-stress transfer of graphene and its tunable resistance by remote plasma treatments in hydrogen. Nanoelectronic Device Applications Handbook. CRC Press, 2017. pp. 365-372
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Chen, W, Tu, CH, Liang, KC, Liu, CY, Liu, C-P & Tzeng, Y-H 2017, Low-stress transfer of graphene and its tunable resistance by remote plasma treatments in hydrogen. in Nanoelectronic Device Applications Handbook. CRC Press, pp. 365-372. https://doi.org/10.1201/b15035

Low-stress transfer of graphene and its tunable resistance by remote plasma treatments in hydrogen. / Chen, Waileong; Tu, Chia Hao; Liang, Keng Chih; Liu, Chih Yi; Liu, Chuan-Pu; Tzeng, Yon-Hua.

Nanoelectronic Device Applications Handbook. CRC Press, 2017. p. 365-372.

Research output: Chapter in Book/Report/Conference proceedingChapter

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Chen W, Tu CH, Liang KC, Liu CY, Liu C-P, Tzeng Y-H. Low-stress transfer of graphene and its tunable resistance by remote plasma treatments in hydrogen. In Nanoelectronic Device Applications Handbook. CRC Press. 2017. p. 365-372 https://doi.org/10.1201/b15035