Low-stress transfer of graphene and its tuneable resistance by remote plasma treatments in hydrogen

Waileong Chen, Chia Hao Tu, Keng Chih Liang, Chih Yi Liu, Chuan Pu Liu, Yonhua Tzeng

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Citations (Scopus)

Abstract

A novel low-stress process for transferring thermal CVD single-layer graphene from copper foils to destination substrates is demonstrated. Electrical and optical characteristics of as-transferred graphene and the hydrogen remote-plasma modified graphene are presented. Although graphene is mechanically very strong considering its atomically thin structure, large-area single-layer graphene is practically very fragile especially during handling and transfer from one substrate to another. Handling of large-area free-standing graphene is even more challenging. Combination of effective transfer and surface treatment of graphene by hydrogenation allows fine tuning of its electrical resistivity for practical applications.

Original languageEnglish
Title of host publication2011 11th IEEE International Conference on Nanotechnology, NANO 2011
Pages1093-1096
Number of pages4
DOIs
Publication statusPublished - 2011
Event2011 11th IEEE International Conference on Nanotechnology, NANO 2011 - Portland, OR, United States
Duration: 2011 Aug 152011 Aug 19

Publication series

NameProceedings of the IEEE Conference on Nanotechnology
ISSN (Print)1944-9399
ISSN (Electronic)1944-9380

Other

Other2011 11th IEEE International Conference on Nanotechnology, NANO 2011
CountryUnited States
CityPortland, OR
Period11-08-1511-08-19

All Science Journal Classification (ASJC) codes

  • Bioengineering
  • Electrical and Electronic Engineering
  • Materials Chemistry
  • Condensed Matter Physics

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