Low-stress transfer of graphene and its tuneable resistance by remote plasma treatments in hydrogen

Waileong Chen, Chia Hao Tu, Keng Chih Liang, Chih Yi Liu, Chuan-Pu Liu, Yon-Hua Tzeng

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Citations (Scopus)

Abstract

A novel low-stress process for transferring thermal CVD single-layer graphene from copper foils to destination substrates is demonstrated. Electrical and optical characteristics of as-transferred graphene and the hydrogen remote-plasma modified graphene are presented. Although graphene is mechanically very strong considering its atomically thin structure, large-area single-layer graphene is practically very fragile especially during handling and transfer from one substrate to another. Handling of large-area free-standing graphene is even more challenging. Combination of effective transfer and surface treatment of graphene by hydrogenation allows fine tuning of its electrical resistivity for practical applications.

Original languageEnglish
Title of host publication2011 11th IEEE International Conference on Nanotechnology, NANO 2011
Pages1093-1096
Number of pages4
DOIs
Publication statusPublished - 2011
Event2011 11th IEEE International Conference on Nanotechnology, NANO 2011 - Portland, OR, United States
Duration: 2011 Aug 152011 Aug 19

Other

Other2011 11th IEEE International Conference on Nanotechnology, NANO 2011
CountryUnited States
CityPortland, OR
Period11-08-1511-08-19

Fingerprint

Graphite
Graphene
Hydrogen
graphene
Plasmas
hydrogen
Substrates
surface treatment
Metal foil
Hydrogenation
hydrogenation
Surface treatment
Copper
Chemical vapor deposition
foils
Tuning
tuning
vapor deposition
copper
electrical resistivity

All Science Journal Classification (ASJC) codes

  • Bioengineering
  • Electrical and Electronic Engineering
  • Materials Chemistry
  • Condensed Matter Physics

Cite this

Chen, W., Tu, C. H., Liang, K. C., Liu, C. Y., Liu, C-P., & Tzeng, Y-H. (2011). Low-stress transfer of graphene and its tuneable resistance by remote plasma treatments in hydrogen. In 2011 11th IEEE International Conference on Nanotechnology, NANO 2011 (pp. 1093-1096). [6144398] https://doi.org/10.1109/NANO.2011.6144398
Chen, Waileong ; Tu, Chia Hao ; Liang, Keng Chih ; Liu, Chih Yi ; Liu, Chuan-Pu ; Tzeng, Yon-Hua. / Low-stress transfer of graphene and its tuneable resistance by remote plasma treatments in hydrogen. 2011 11th IEEE International Conference on Nanotechnology, NANO 2011. 2011. pp. 1093-1096
@inproceedings{f7f0d0ca1b5b48899c347983f0da42ca,
title = "Low-stress transfer of graphene and its tuneable resistance by remote plasma treatments in hydrogen",
abstract = "A novel low-stress process for transferring thermal CVD single-layer graphene from copper foils to destination substrates is demonstrated. Electrical and optical characteristics of as-transferred graphene and the hydrogen remote-plasma modified graphene are presented. Although graphene is mechanically very strong considering its atomically thin structure, large-area single-layer graphene is practically very fragile especially during handling and transfer from one substrate to another. Handling of large-area free-standing graphene is even more challenging. Combination of effective transfer and surface treatment of graphene by hydrogenation allows fine tuning of its electrical resistivity for practical applications.",
author = "Waileong Chen and Tu, {Chia Hao} and Liang, {Keng Chih} and Liu, {Chih Yi} and Chuan-Pu Liu and Yon-Hua Tzeng",
year = "2011",
doi = "10.1109/NANO.2011.6144398",
language = "English",
isbn = "9781457715143",
pages = "1093--1096",
booktitle = "2011 11th IEEE International Conference on Nanotechnology, NANO 2011",

}

Chen, W, Tu, CH, Liang, KC, Liu, CY, Liu, C-P & Tzeng, Y-H 2011, Low-stress transfer of graphene and its tuneable resistance by remote plasma treatments in hydrogen. in 2011 11th IEEE International Conference on Nanotechnology, NANO 2011., 6144398, pp. 1093-1096, 2011 11th IEEE International Conference on Nanotechnology, NANO 2011, Portland, OR, United States, 11-08-15. https://doi.org/10.1109/NANO.2011.6144398

Low-stress transfer of graphene and its tuneable resistance by remote plasma treatments in hydrogen. / Chen, Waileong; Tu, Chia Hao; Liang, Keng Chih; Liu, Chih Yi; Liu, Chuan-Pu; Tzeng, Yon-Hua.

2011 11th IEEE International Conference on Nanotechnology, NANO 2011. 2011. p. 1093-1096 6144398.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

TY - GEN

T1 - Low-stress transfer of graphene and its tuneable resistance by remote plasma treatments in hydrogen

AU - Chen, Waileong

AU - Tu, Chia Hao

AU - Liang, Keng Chih

AU - Liu, Chih Yi

AU - Liu, Chuan-Pu

AU - Tzeng, Yon-Hua

PY - 2011

Y1 - 2011

N2 - A novel low-stress process for transferring thermal CVD single-layer graphene from copper foils to destination substrates is demonstrated. Electrical and optical characteristics of as-transferred graphene and the hydrogen remote-plasma modified graphene are presented. Although graphene is mechanically very strong considering its atomically thin structure, large-area single-layer graphene is practically very fragile especially during handling and transfer from one substrate to another. Handling of large-area free-standing graphene is even more challenging. Combination of effective transfer and surface treatment of graphene by hydrogenation allows fine tuning of its electrical resistivity for practical applications.

AB - A novel low-stress process for transferring thermal CVD single-layer graphene from copper foils to destination substrates is demonstrated. Electrical and optical characteristics of as-transferred graphene and the hydrogen remote-plasma modified graphene are presented. Although graphene is mechanically very strong considering its atomically thin structure, large-area single-layer graphene is practically very fragile especially during handling and transfer from one substrate to another. Handling of large-area free-standing graphene is even more challenging. Combination of effective transfer and surface treatment of graphene by hydrogenation allows fine tuning of its electrical resistivity for practical applications.

UR - http://www.scopus.com/inward/record.url?scp=84858994478&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84858994478&partnerID=8YFLogxK

U2 - 10.1109/NANO.2011.6144398

DO - 10.1109/NANO.2011.6144398

M3 - Conference contribution

SN - 9781457715143

SP - 1093

EP - 1096

BT - 2011 11th IEEE International Conference on Nanotechnology, NANO 2011

ER -

Chen W, Tu CH, Liang KC, Liu CY, Liu C-P, Tzeng Y-H. Low-stress transfer of graphene and its tuneable resistance by remote plasma treatments in hydrogen. In 2011 11th IEEE International Conference on Nanotechnology, NANO 2011. 2011. p. 1093-1096. 6144398 https://doi.org/10.1109/NANO.2011.6144398