Abstract
Well-aligned ZnO nanorods have been grown on Si (100) substrates using a simple, catalyst-free CVD method at low temperatures. Structural analyses show that the nanorods grown on Si (100) are preferentially oriented in the c-axis direction. An amorphous SiOx layer in the interface of ZnO nanorods and Si (100) is observed from the HRTEM and EELS images. The well-aligned ZnO nanorods exhibit a strong PL emission of 380 nm at room temperature. A negligible green band emission in the PL spectra indicates that there is a very low concentration of oxygen vacancies in the highly oriented ZnO nanorods. Diameter control of the well-aligned and high-quality ZnO nanorods on Si (100) substrates is achievable by varying the growth conditions.
Original language | English |
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Pages (from-to) | 3125-3129 |
Number of pages | 5 |
Journal | Journal of Materials Chemistry |
Volume | 12 |
Issue number | 10 |
DOIs | |
Publication status | Published - 2002 Oct 1 |
All Science Journal Classification (ASJC) codes
- General Chemistry
- Materials Chemistry