Low-temperature CVD carbon coatings on glass plates for flat panel display applications

Yon-Hua Tzeng, C. Liu, C. Cutshaw, Z. Chen

Research output: Contribution to journalConference article

Abstract

Low-temperature chemical vapour deposition processes were studied for coating carbon films on metal-coated glass plates. Thermal CVD in hydrocarbon mixtures was used for carbon deposition at temperatures between 300°C and 550°C. Carbon deposited on metal coated glass plates were examined by SEM and analyzed using a pin to disk setup in an ultra high vacuum chamber for measuring the electron emission characteristics. Using a one-millimeter diameter tungsten rod with a hemispherical tip as the anode while the carbon coatings as the cathode, current-voltage characteristics of the carbon coatings were measured and used for calculating the electric field at which electron emission started as well as calculating the field enhancement factor of the carbon coatings. Field emission of electrons from carbon coatings starting from an electric field as low as 1.4 volts per micrometer has been achieved.

Original languageEnglish
JournalMaterials Research Society Symposium - Proceedings
Volume621
Publication statusPublished - 2000 Dec 1
EventElectron-Emissive Materials, Vacuum Microelectronics and Flat-Panel Displays - San Francisco, CA, United States
Duration: 2000 Apr 252000 Apr 27

Fingerprint

Flat panel displays
flat panel displays
Chemical vapor deposition
Carbon
vapor deposition
coatings
Glass
Coatings
glass
carbon
Electron emission
Temperature
electron emission
Metals
Electric fields
Tungsten
Carbon films
Ultrahigh vacuum
Current voltage characteristics
Hydrocarbons

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

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abstract = "Low-temperature chemical vapour deposition processes were studied for coating carbon films on metal-coated glass plates. Thermal CVD in hydrocarbon mixtures was used for carbon deposition at temperatures between 300°C and 550°C. Carbon deposited on metal coated glass plates were examined by SEM and analyzed using a pin to disk setup in an ultra high vacuum chamber for measuring the electron emission characteristics. Using a one-millimeter diameter tungsten rod with a hemispherical tip as the anode while the carbon coatings as the cathode, current-voltage characteristics of the carbon coatings were measured and used for calculating the electric field at which electron emission started as well as calculating the field enhancement factor of the carbon coatings. Field emission of electrons from carbon coatings starting from an electric field as low as 1.4 volts per micrometer has been achieved.",
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Low-temperature CVD carbon coatings on glass plates for flat panel display applications. / Tzeng, Yon-Hua; Liu, C.; Cutshaw, C.; Chen, Z.

In: Materials Research Society Symposium - Proceedings, Vol. 621, 01.12.2000.

Research output: Contribution to journalConference article

TY - JOUR

T1 - Low-temperature CVD carbon coatings on glass plates for flat panel display applications

AU - Tzeng, Yon-Hua

AU - Liu, C.

AU - Cutshaw, C.

AU - Chen, Z.

PY - 2000/12/1

Y1 - 2000/12/1

N2 - Low-temperature chemical vapour deposition processes were studied for coating carbon films on metal-coated glass plates. Thermal CVD in hydrocarbon mixtures was used for carbon deposition at temperatures between 300°C and 550°C. Carbon deposited on metal coated glass plates were examined by SEM and analyzed using a pin to disk setup in an ultra high vacuum chamber for measuring the electron emission characteristics. Using a one-millimeter diameter tungsten rod with a hemispherical tip as the anode while the carbon coatings as the cathode, current-voltage characteristics of the carbon coatings were measured and used for calculating the electric field at which electron emission started as well as calculating the field enhancement factor of the carbon coatings. Field emission of electrons from carbon coatings starting from an electric field as low as 1.4 volts per micrometer has been achieved.

AB - Low-temperature chemical vapour deposition processes were studied for coating carbon films on metal-coated glass plates. Thermal CVD in hydrocarbon mixtures was used for carbon deposition at temperatures between 300°C and 550°C. Carbon deposited on metal coated glass plates were examined by SEM and analyzed using a pin to disk setup in an ultra high vacuum chamber for measuring the electron emission characteristics. Using a one-millimeter diameter tungsten rod with a hemispherical tip as the anode while the carbon coatings as the cathode, current-voltage characteristics of the carbon coatings were measured and used for calculating the electric field at which electron emission started as well as calculating the field enhancement factor of the carbon coatings. Field emission of electrons from carbon coatings starting from an electric field as low as 1.4 volts per micrometer has been achieved.

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