Engineering & Materials Science
Growth temperature
100%
Reactive sputtering
97%
Inductively coupled plasma
92%
Gallium nitride
85%
Magnetron sputtering
82%
Sputtering
59%
Plasma sources
50%
Ionization
40%
Crystalline materials
32%
Plasma density
25%
Crystallites
22%
Substrates
21%
Sapphire
20%
Gases
17%
X ray diffraction
15%
Liquids
10%
Chemical analysis
10%
Chemical Compounds
Magnetron Sputtering
71%
Nitride
59%
Sputtering Target
52%
Inductively Coupled Plasma
30%
Liquid Film
29%
Ionization
24%
Holder
19%
Nitrogen
18%
Sputtering
16%
Gas
16%
Crystallite
12%
Plasma
9%
Liquid
8%
X-Ray Diffraction
7%
Physics & Astronomy
gallium nitrides
72%
magnetron sputtering
51%
sputtering
36%
nitrogen
22%
ionization
21%
holders
17%
gases
15%
plasma density
15%
crystallites
13%
sapphire
13%
temperature
9%
diffraction
8%
liquids
8%
x rays
6%