Low temperature growth of highly transparent nanocrystalline diamond films on quartz glass by hot filament chemical vapor deposition

Min Sheng You, Franklin Chau Nan Hong, Yeau Ren Jeng, Shih Ming Huang

Research output: Contribution to journalArticlepeer-review

35 Citations (Scopus)

Abstract

Highly transparent and hard nanocrystalline diamond (NCD) films were prepared on quartz glass by hot filament chemical vapor deposition (HFCVD). The effects of total gas pressure, substrate's temperature, and concentration of CH4 on the grain size, surface's roughness and hardness, growth rate, as well as the optical properties of NCD films were investigated. The results indicated that with a low total gas pressure and high CH4 concentration, high frequency of secondary nucleation can be obtained. In addition, low substrate temperature can increase the rate of the hydrogen atom etched sp2 graphite carbon in the film, yielding a smooth surface of NCD films and very high sp3 content. Under optimized conditions, the hardness can be enhanced up to 65 Gpa, with 80% maximum transmittance in the visible light region. The aforementioned reaction platform outcomes a 1.2 μm thickness of NCD coating with a low root-mean-square (r.m.s.) surface roughness around 12-13 nm and a high growth rate around 1 μm/h. The influences of the total gas pressure, substrate's temperature, and CH4 concentration for growing NCD films were also discussed in this paper.

Original languageEnglish
Pages (from-to)155-159
Number of pages5
JournalDiamond and Related Materials
Volume18
Issue number2-3
DOIs
Publication statusPublished - 2009 Feb 1

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Chemistry(all)
  • Mechanical Engineering
  • Materials Chemistry
  • Electrical and Electronic Engineering

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