Low temperature growths of nanocrystalline diamond films by plasma-assisted hot filament chemical vapor deposition

Shr Ming Huang, Franklin Chau Nan Hong

Research output: Contribution to journalArticlepeer-review

9 Citations (Scopus)

Abstract

Nanocrystalline diamond (NCD) films were prepared at a substrate temperature of 650-700 °C by negatively biasing the substrate in a plasma-assisted hot filament chemical vapor deposition system (HFCVD). NCD films with root-mean-square roughness around 12-13 nm and an average grain size of 5 nm were obtained. The growth rate of NCD film was as high as 3 μm/h. Micro-Raman spectroscopy shows clearly a broad peak around 1140 cm-1, characteristic of nanocrystalline diamond. Transmission electron microscopy (TEM) identified the diamond nanocrystallites. The growth mechanism of the NCD films synthesized at a low temperature is also discussed.

Original languageEnglish
Pages (from-to)3160-3165
Number of pages6
JournalSurface and Coatings Technology
Volume200
Issue number10 SPEC. ISS.
DOIs
Publication statusPublished - 2006 Feb 24

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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