m-plane GaN/InGaN/AlInN on LiAlO2 grown by MOVPE

  • H. Behmenburg
  • , T. C. Wen
  • , Y. Dikme
  • , C. Mauder
  • , L. Rahimzadeh Khoshroo
  • , M. M.C. Chou
  • , M. V. Rzheutskii
  • , E. V. Lutsenko
  • , G. P. Yablonskii
  • , J. Woitok
  • , H. Kalisch
  • , R. H. Jansen
  • , M. Heuken

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)

Abstract

We present a study of growth and properties of m-plane GaN/InGaN/AlInN structures on LiAlO2 substrates grown by metal organic vapour phase epitaxy (MOVPE). A buffer structure, including an m-plane AlInN interlayer prior to GaN growth, has been developed. Quantum well structures on top of this buffer showed absence of polarization-induced electric fields verified by room temperature photoluminescence (RT PL) measurements with different excitation intensities. Different samples with peak emission wavelength between 433 nm and 495 nm exhibited stable peak position even for high excitation intensities of 500 kW/cm2.

Original languageEnglish
Pages (from-to)893-895
Number of pages3
JournalPhysica Status Solidi (B) Basic Research
Volume245
Issue number5
DOIs
Publication statusPublished - 2008 May

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

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