Magnetic anisotropy of permalloy films grown on an Mo(001) stepped surface

C. C. Yu, Jung-Chun Huang, Y. M. Hu

Research output: Contribution to journalConference article

1 Citation (Scopus)

Abstract

The Mo(001) stepped surface was self-assembled on Al2O3(l-102) substrate by molecular beam epitaxy. Ni80Fe20 films were subsequently deposited on the fresh Mo(001) stepped surface at growth temperature (Tg) between 30 and 400°C. Interestingly, in the low Tg regime (<100°C) the Ni80Fe20 films were grown as (001) single crystal while high Tg (>300°C) results in the growth of Ni80Fe20 (110) quadcrystal. For low Tg samples, the easy axis of the Ni80Fe20 film is directed parallel to the underlying Mo step edge direction and the M-H loop along the hard axis reveals a two-step magnetic moment rotation process. In contrast, the high Tg samples display isotropic-like magnetic behavior with a much enhanced coercivity due likely to the surface roughness effect. We conclude that the growth temperature of Ni80Fe20 film on the Mo stepped surface plays an important role on the crystal structure and magnetic anisotropy of Ni80Fe20 film.

Original languageEnglish
Pages (from-to)7380-7382
Number of pages3
JournalJournal of Applied Physics
Volume89
Issue number11 II
DOIs
Publication statusPublished - 2001 Jun 1
Event8th Joint Magnetism and Magnetic Materials-Intermag Conference - San Antonio, TX, United States
Duration: 2001 Jan 72001 Jan 11

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Permalloys (trademark)
anisotropy
surface roughness effects
coercivity
molecular beam epitaxy
magnetic moments
crystal structure
temperature

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

Cite this

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title = "Magnetic anisotropy of permalloy films grown on an Mo(001) stepped surface",
abstract = "The Mo(001) stepped surface was self-assembled on Al2O3(l-102) substrate by molecular beam epitaxy. Ni80Fe20 films were subsequently deposited on the fresh Mo(001) stepped surface at growth temperature (Tg) between 30 and 400°C. Interestingly, in the low Tg regime (<100°C) the Ni80Fe20 films were grown as (001) single crystal while high Tg (>300°C) results in the growth of Ni80Fe20 (110) quadcrystal. For low Tg samples, the easy axis of the Ni80Fe20 film is directed parallel to the underlying Mo step edge direction and the M-H loop along the hard axis reveals a two-step magnetic moment rotation process. In contrast, the high Tg samples display isotropic-like magnetic behavior with a much enhanced coercivity due likely to the surface roughness effect. We conclude that the growth temperature of Ni80Fe20 film on the Mo stepped surface plays an important role on the crystal structure and magnetic anisotropy of Ni80Fe20 film.",
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Magnetic anisotropy of permalloy films grown on an Mo(001) stepped surface. / Yu, C. C.; Huang, Jung-Chun; Hu, Y. M.

In: Journal of Applied Physics, Vol. 89, No. 11 II, 01.06.2001, p. 7380-7382.

Research output: Contribution to journalConference article

TY - JOUR

T1 - Magnetic anisotropy of permalloy films grown on an Mo(001) stepped surface

AU - Yu, C. C.

AU - Huang, Jung-Chun

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N2 - The Mo(001) stepped surface was self-assembled on Al2O3(l-102) substrate by molecular beam epitaxy. Ni80Fe20 films were subsequently deposited on the fresh Mo(001) stepped surface at growth temperature (Tg) between 30 and 400°C. Interestingly, in the low Tg regime (<100°C) the Ni80Fe20 films were grown as (001) single crystal while high Tg (>300°C) results in the growth of Ni80Fe20 (110) quadcrystal. For low Tg samples, the easy axis of the Ni80Fe20 film is directed parallel to the underlying Mo step edge direction and the M-H loop along the hard axis reveals a two-step magnetic moment rotation process. In contrast, the high Tg samples display isotropic-like magnetic behavior with a much enhanced coercivity due likely to the surface roughness effect. We conclude that the growth temperature of Ni80Fe20 film on the Mo stepped surface plays an important role on the crystal structure and magnetic anisotropy of Ni80Fe20 film.

AB - The Mo(001) stepped surface was self-assembled on Al2O3(l-102) substrate by molecular beam epitaxy. Ni80Fe20 films were subsequently deposited on the fresh Mo(001) stepped surface at growth temperature (Tg) between 30 and 400°C. Interestingly, in the low Tg regime (<100°C) the Ni80Fe20 films were grown as (001) single crystal while high Tg (>300°C) results in the growth of Ni80Fe20 (110) quadcrystal. For low Tg samples, the easy axis of the Ni80Fe20 film is directed parallel to the underlying Mo step edge direction and the M-H loop along the hard axis reveals a two-step magnetic moment rotation process. In contrast, the high Tg samples display isotropic-like magnetic behavior with a much enhanced coercivity due likely to the surface roughness effect. We conclude that the growth temperature of Ni80Fe20 film on the Mo stepped surface plays an important role on the crystal structure and magnetic anisotropy of Ni80Fe20 film.

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