TY - JOUR
T1 - Maskless lithography based on digital micromirror device (DMD) and double sided microlens and spatial filter array
AU - Dinh, Duc Hanh
AU - Chien, Hung Liang
AU - Lee, Yung Chun
N1 - Funding Information:
The authors would like to thank the Minister of Science and Technology in Taiwan for financially supporting this research under project number MOST 105-2622-E-006-007-CC2.
PY - 2019/5
Y1 - 2019/5
N2 - A new type of maskless lithography system based on digital mirror device (DMD) is proposed, constructed, and experimentally demonstrated. It includes a pin-hole array sandwiched by two microlens arrays on each side, known as double-sided microlens/spatial-filter array (D-MSFA), and aligned with a DMD. Ultraviolet (UV) light reflected by DMD is first collected by the first microlens array, filtered through the pin-hole array, and then re-focused by the second microlens array into a UV spot array. Along with an obliquely scanning method, this D-MSFA/DMD-based maskless lithography system can perform not only 2D but also 3D UV patterning. Experimental testing successfully generates complicated patterns with a minimum line-width of 3.36 μm. Direct 3D patterning and 3D microfabrication are also experimentally demonstrated on a photoresist layer. Excellent profile accuracy and surface structure qualities are observed with great potentials for future 2D and 3D microfabrication in a maskless manner.
AB - A new type of maskless lithography system based on digital mirror device (DMD) is proposed, constructed, and experimentally demonstrated. It includes a pin-hole array sandwiched by two microlens arrays on each side, known as double-sided microlens/spatial-filter array (D-MSFA), and aligned with a DMD. Ultraviolet (UV) light reflected by DMD is first collected by the first microlens array, filtered through the pin-hole array, and then re-focused by the second microlens array into a UV spot array. Along with an obliquely scanning method, this D-MSFA/DMD-based maskless lithography system can perform not only 2D but also 3D UV patterning. Experimental testing successfully generates complicated patterns with a minimum line-width of 3.36 μm. Direct 3D patterning and 3D microfabrication are also experimentally demonstrated on a photoresist layer. Excellent profile accuracy and surface structure qualities are observed with great potentials for future 2D and 3D microfabrication in a maskless manner.
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U2 - 10.1016/j.optlastec.2019.01.001
DO - 10.1016/j.optlastec.2019.01.001
M3 - Article
AN - SCOPUS:85060023035
SN - 0030-3992
VL - 113
SP - 407
EP - 415
JO - Optics and Laser Technology
JF - Optics and Laser Technology
ER -