Abstract
A GaAs voltage-controlled negative differential resistance power transistor using n+-i-p+-i-n+ structure prepared by molecular beam epitaxy (MBE) are presented. The peak-to-valley current ratios (PVRs), peak current densities and generated power outputs can be easily modulated by changing the third external base to emitter bias. A highest PVR of 140 with VBE=0.5V at room temperature has been obtained. This is proposed to be due to the bipolar-unipolar transition reaction. For power consideration, it can be compared with resonant tunneling hot electron transistors.
Original language | English |
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Pages | 55-58 |
Number of pages | 4 |
DOIs | |
Publication status | Published - 1990 |
Event | 22nd International Conference on Solid State Devices and Materials - Sendai, Jpn Duration: 1990 Aug 22 → 1990 Aug 24 |
Other
Other | 22nd International Conference on Solid State Devices and Materials |
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City | Sendai, Jpn |
Period | 90-08-22 → 90-08-24 |
All Science Journal Classification (ASJC) codes
- General Engineering