Measurement uncertainty in nanometrology: Leveraging attributes of TEM and CD AFM

Hao-Chih Liu; Gregory A. Dahlen; Marc Osborn; Jason R. Osborne; Lars Mininni; Bryan Tracy; Amalia Del Rosario

Measurement uncertainty in nanometrology: Leveraging attributes of TEM and CD AFM

Hao-Chih Liu, Gregory A. Dahlen, Marc Osborn, Jason R. Osborne, Lars Mininni, Bryan Tracy, Amalia Del Rosario

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

A new method is presented to accurately determine the exact location of a transmission electron microscopy (TEM) sample extraction site using critical dimension atomic force microscopy (CD AFM), The method entails use of the CD AFM to nondestructively pre-screen the sample, thus acquiring a "finger print" of the surface morphology in the region of interest. Following TEM sample "milling" and extraction, the acquired TEM micrograph feature measurements are matched to their CD AFM counterparts. By acquiring multiple feature profiles within the same TEM sample, the matching and "unique" TEM sample location is determined independently of scaling variation between the TEM and CD AFM metrologies. This method is then used to validate CD AFM image reconstruction algorithms in the present paper.

Original language	English
Title of host publication	2007 IEEE Instrumentation and Measurement Technology, IMTC 2007 - Conference Proceedings - Synergy of Science and Technology in Instrumentation and Measurement
Publication status	Published - 2007
Event	2007 IEEE Instrumentation and Measurement Technology, IMTC 2007 - Synergy of Science and Technology in Instrumentation and Measurement - Warsaw, Poland Duration: 2007 May 1 → 2007 May 3

Other

Other	2007 IEEE Instrumentation and Measurement Technology, IMTC 2007 - Synergy of Science and Technology in Instrumentation and Measurement
Country/Territory	Poland
City	Warsaw
Period	07-05-01 → 07-05-03

All Science Journal Classification (ASJC) codes

Electrical and Electronic Engineering

Cite this

@inproceedings{d904acdc2e2046ba937325647ff52126,

title = "Measurement uncertainty in nanometrology: Leveraging attributes of TEM and CD AFM",

abstract = "A new method is presented to accurately determine the exact location of a transmission electron microscopy (TEM) sample extraction site using critical dimension atomic force microscopy (CD AFM), The method entails use of the CD AFM to nondestructively pre-screen the sample, thus acquiring a {"}finger print{"} of the surface morphology in the region of interest. Following TEM sample {"}milling{"} and extraction, the acquired TEM micrograph feature measurements are matched to their CD AFM counterparts. By acquiring multiple feature profiles within the same TEM sample, the matching and {"}unique{"} TEM sample location is determined independently of scaling variation between the TEM and CD AFM metrologies. This method is then used to validate CD AFM image reconstruction algorithms in the present paper.",

author = "Hao-Chih Liu and Dahlen, {Gregory A.} and Marc Osborn and Osborne, {Jason R.} and Lars Mininni and Bryan Tracy and {Del Rosario}, Amalia",

year = "2007",

language = "English",

isbn = "1424410800",

booktitle = "2007 IEEE Instrumentation and Measurement Technology, IMTC 2007 - Conference Proceedings - Synergy of Science and Technology in Instrumentation and Measurement",

note = "2007 IEEE Instrumentation and Measurement Technology, IMTC 2007 - Synergy of Science and Technology in Instrumentation and Measurement ; Conference date: 01-05-2007 Through 03-05-2007",

}

Liu, H-C, Dahlen, GA, Osborn, M, Osborne, JR, Mininni, L, Tracy, B & Del Rosario, A 2007, Measurement uncertainty in nanometrology: Leveraging attributes of TEM and CD AFM. in 2007 IEEE Instrumentation and Measurement Technology, IMTC 2007 - Conference Proceedings - Synergy of Science and Technology in Instrumentation and Measurement., 4258228, 2007 IEEE Instrumentation and Measurement Technology, IMTC 2007 - Synergy of Science and Technology in Instrumentation and Measurement, Warsaw, Poland, 07-05-01.

Measurement uncertainty in nanometrology: Leveraging attributes of TEM and CD AFM. / Liu, Hao-Chih; Dahlen, Gregory A.; Osborn, Marc et al.
2007 IEEE Instrumentation and Measurement Technology, IMTC 2007 - Conference Proceedings - Synergy of Science and Technology in Instrumentation and Measurement. 2007. 4258228.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

TY - GEN

T1 - Measurement uncertainty in nanometrology

T2 - 2007 IEEE Instrumentation and Measurement Technology, IMTC 2007 - Synergy of Science and Technology in Instrumentation and Measurement

AU - Liu, Hao-Chih

AU - Dahlen, Gregory A.

AU - Osborn, Marc

AU - Osborne, Jason R.

AU - Mininni, Lars

AU - Tracy, Bryan

AU - Del Rosario, Amalia

PY - 2007

Y1 - 2007

N2 - A new method is presented to accurately determine the exact location of a transmission electron microscopy (TEM) sample extraction site using critical dimension atomic force microscopy (CD AFM), The method entails use of the CD AFM to nondestructively pre-screen the sample, thus acquiring a "finger print" of the surface morphology in the region of interest. Following TEM sample "milling" and extraction, the acquired TEM micrograph feature measurements are matched to their CD AFM counterparts. By acquiring multiple feature profiles within the same TEM sample, the matching and "unique" TEM sample location is determined independently of scaling variation between the TEM and CD AFM metrologies. This method is then used to validate CD AFM image reconstruction algorithms in the present paper.

AB - A new method is presented to accurately determine the exact location of a transmission electron microscopy (TEM) sample extraction site using critical dimension atomic force microscopy (CD AFM), The method entails use of the CD AFM to nondestructively pre-screen the sample, thus acquiring a "finger print" of the surface morphology in the region of interest. Following TEM sample "milling" and extraction, the acquired TEM micrograph feature measurements are matched to their CD AFM counterparts. By acquiring multiple feature profiles within the same TEM sample, the matching and "unique" TEM sample location is determined independently of scaling variation between the TEM and CD AFM metrologies. This method is then used to validate CD AFM image reconstruction algorithms in the present paper.

UR - http://www.scopus.com/inward/record.url?scp=34648819485&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=34648819485&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:34648819485

SN - 1424410800

SN - 9781424410804

BT - 2007 IEEE Instrumentation and Measurement Technology, IMTC 2007 - Conference Proceedings - Synergy of Science and Technology in Instrumentation and Measurement

Y2 - 1 May 2007 through 3 May 2007

ER -

Measurement uncertainty in nanometrology: Leveraging attributes of TEM and CD AFM

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All Science Journal Classification (ASJC) codes

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