Mechanical characterization of atomic layer deposited (ALD) alumina for applications in corrosive environments

Kuang Shun Ou, I. Kuan Lin, Ping Hsing Wu, Zhi Kai Huang, Kuo Shen Chen, Xin Zhang

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)


In this work, thin ALD alumina films were fabricated for evaluating their capabilities as a barrier material for corrosive environments. The fracture toughness and the corrosion-resisting properties after fatigue cycle of these thin ALD alumina films have been characterized. Indentation tests indicate that the ALD alumina/Al structures could enhance both the yield strength of the metal and the effective fracture toughness of the coated ALD alumina films and this result could be useful for designing nanocomposite structures. However, the test results also indicate that the interfacial strength of the ALD/A1 structures was prone to degrade under fatigue loading under corrosive environment. This could potentially be a problem for the long term reliability of related devices operated under a harsh environment. In addition, the strong correlation between indentation behavior and fatigue loading for the structure indicate that nanoindentation response could be possibly used to indicate the damage level of microstructures for future reliability evaluations.

Original languageEnglish
Title of host publicationMicroelectromechanical Systems - Materials and Devices III
Number of pages6
Publication statusPublished - 2010
Event2009 MRS Fall Meeting - Boston, MA, United States
Duration: 2009 Nov 302009 Dec 4

Publication series

NameMaterials Research Society Symposium Proceedings
ISSN (Print)0272-9172


Other2009 MRS Fall Meeting
Country/TerritoryUnited States
CityBoston, MA

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering


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