Abstract
10-nm-thick atomic layer deposited HfO2 films were characterized in terms of wear resistance and indentation hardness to investigate the thermal annealing induced impacts on mechanical properties. The wear resistance of ultra-thin films at low loads was characterized using nano-scratch tests with an atomic force microscope. The depth of the nano-scratches decreases with increasing annealing temperature, indicating that the hardness of the annealed films increases with the annealing temperatures. Surface nanoindentation was also performed to confirm the nanoscratch test results. The hardness variation of the annealed films is due to the generation of HfSixOy induced by the thermal annealing. X-ray photoelectron spectroscopy measurements proved that the hardness of formed HfSixOy with increasing annealing temperatures. The existence of HfSixOy broadens the interface, and causes the increase of the interfacial layer thickness. As a result, the surface hardness increases with the increasing HfSi xOy induced by the thermal annealing.
| Original language | English |
|---|---|
| Pages (from-to) | 402-406 |
| Number of pages | 5 |
| Journal | Thin Solid Films |
| Volume | 529 |
| DOIs | |
| Publication status | Published - 2013 Feb 1 |
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All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Metals and Alloys
- Materials Chemistry
Cite this
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Mechanical properties of ultra-thin HfO2 films studied by nano scratches tests. / Fu, Wei En; Chang, Yong Qing; Chang, Chia Wei; Yao, Chih Kai; Liao, Jiunn-Der.
In: Thin Solid Films, Vol. 529, 01.02.2013, p. 402-406.Research output: Contribution to journal › Article
TY - JOUR
T1 - Mechanical properties of ultra-thin HfO2 films studied by nano scratches tests
AU - Fu, Wei En
AU - Chang, Yong Qing
AU - Chang, Chia Wei
AU - Yao, Chih Kai
AU - Liao, Jiunn-Der
PY - 2013/2/1
Y1 - 2013/2/1
N2 - 10-nm-thick atomic layer deposited HfO2 films were characterized in terms of wear resistance and indentation hardness to investigate the thermal annealing induced impacts on mechanical properties. The wear resistance of ultra-thin films at low loads was characterized using nano-scratch tests with an atomic force microscope. The depth of the nano-scratches decreases with increasing annealing temperature, indicating that the hardness of the annealed films increases with the annealing temperatures. Surface nanoindentation was also performed to confirm the nanoscratch test results. The hardness variation of the annealed films is due to the generation of HfSixOy induced by the thermal annealing. X-ray photoelectron spectroscopy measurements proved that the hardness of formed HfSixOy with increasing annealing temperatures. The existence of HfSixOy broadens the interface, and causes the increase of the interfacial layer thickness. As a result, the surface hardness increases with the increasing HfSi xOy induced by the thermal annealing.
AB - 10-nm-thick atomic layer deposited HfO2 films were characterized in terms of wear resistance and indentation hardness to investigate the thermal annealing induced impacts on mechanical properties. The wear resistance of ultra-thin films at low loads was characterized using nano-scratch tests with an atomic force microscope. The depth of the nano-scratches decreases with increasing annealing temperature, indicating that the hardness of the annealed films increases with the annealing temperatures. Surface nanoindentation was also performed to confirm the nanoscratch test results. The hardness variation of the annealed films is due to the generation of HfSixOy induced by the thermal annealing. X-ray photoelectron spectroscopy measurements proved that the hardness of formed HfSixOy with increasing annealing temperatures. The existence of HfSixOy broadens the interface, and causes the increase of the interfacial layer thickness. As a result, the surface hardness increases with the increasing HfSi xOy induced by the thermal annealing.
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U2 - 10.1016/j.tsf.2012.05.053
DO - 10.1016/j.tsf.2012.05.053
M3 - Article
VL - 529
SP - 402
EP - 406
JO - Thin Solid Films
JF - Thin Solid Films
SN - 0040-6090
ER -