Mechanism of chemical mechanical planarization induced edge corrosion of copper line for Cu/Low-k SiOC interconnects

Yung Lung Hsu, Yean Kuen Fang, Yen Ting Chiang, Tse Heng Chou, Franklin Chau-Nan Hong

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)

Abstract

For complementary metal-oxide-semiconductor (CMOS) technology beyond 90 nm with a very narrow line width, one critical issue is the line edge corrosion in Cu interconnects and the succeeding via process failure. The mechanism of Cu line edge corrosion resulting from the hydrophobic characteristic of low-k SiOC dielectric after the chemical mechanical planarization (CMP) process was studied in detail through the scanning electron microscopy (SEM) analysis and contact angle measurements. The hydrophobic characteristic of low-k dielectric induces a high surface tension that pushes the H2O2 molecules contained in CMP slurry toward the edge of the Cu line, thus enhancing the corrosion reaction. We illustrate the mechanism comprehensively using a schematic model.

Original languageEnglish
Pages (from-to)530-535
Number of pages6
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume46
Issue number2
DOIs
Publication statusPublished - 2007 Feb 8

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

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