Micromachined electron source

David A. Crewe, Dung-Ching Perng, S. E. Shoaf, Alan D. Feinerman

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

A new microfabrication technique that allows the precise construction of large three dimensional structures with dimensional tolerances approaching 1 micron is being applied to the design of a miniature scanning electron microscope (MSEM). In this paper we present the electron optic calculations of the MSEM source (gun). The MSEM measures less than one cubic centimeter and the source measures approximately 1 × 1 × 0.20 cm3. The details of the MSEM fabrication are in an accompanying article. There are many advantages of a MSEM. The performance of an SEM is improved as its length is reduced. The need for mechanical adjustments and motion feedthroughs is eliminated since the microscope components are pre-aligned to the optic axis. All components are ultra high vacuum compatible and can be heated to 500°C. A small, portable electron microscope can be brought to the sample to be inspected instead of the sample being brought to the microscope. Vacuum hardware requirements are minimized. The fabrication technology is inexpensive with respect to the conventional methods of electron microscope construction. Arrays of MSEMs can be built to allow applications in high throughput e-beam lithography. In addition two MSEMs can be mounted a few degrees apart to provide stereo imaging.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
PublisherPubl by Int Soc for Optical Engineering
Pages66-77
Number of pages12
ISBN (Print)0819409502
Publication statusPublished - 1992 Dec 1
EventImaging Technologies and Applications - Chicago, IL, USA
Duration: 1992 Mar 191992 Mar 19

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume1778
ISSN (Print)0277-786X

Other

OtherImaging Technologies and Applications
CityChicago, IL, USA
Period92-03-1992-03-19

Fingerprint

Electron sources
electron sources
Scanning Electron Microscope
Electron microscopes
electron microscopes
Microscope
Electron
Scanning
scanning
Optics
Fabrication
Vacuum
E-beam Lithography
Microfabrication
Microscopes
microscopes
Electron optics
electron optics
High Throughput
Tolerance

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

Crewe, D. A., Perng, D-C., Shoaf, S. E., & Feinerman, A. D. (1992). Micromachined electron source. In Proceedings of SPIE - The International Society for Optical Engineering (pp. 66-77). (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 1778). Publ by Int Soc for Optical Engineering.
Crewe, David A. ; Perng, Dung-Ching ; Shoaf, S. E. ; Feinerman, Alan D. / Micromachined electron source. Proceedings of SPIE - The International Society for Optical Engineering. Publ by Int Soc for Optical Engineering, 1992. pp. 66-77 (Proceedings of SPIE - The International Society for Optical Engineering).
@inproceedings{6334c42db44c4436ac116b10166011aa,
title = "Micromachined electron source",
abstract = "A new microfabrication technique that allows the precise construction of large three dimensional structures with dimensional tolerances approaching 1 micron is being applied to the design of a miniature scanning electron microscope (MSEM). In this paper we present the electron optic calculations of the MSEM source (gun). The MSEM measures less than one cubic centimeter and the source measures approximately 1 × 1 × 0.20 cm3. The details of the MSEM fabrication are in an accompanying article. There are many advantages of a MSEM. The performance of an SEM is improved as its length is reduced. The need for mechanical adjustments and motion feedthroughs is eliminated since the microscope components are pre-aligned to the optic axis. All components are ultra high vacuum compatible and can be heated to 500°C. A small, portable electron microscope can be brought to the sample to be inspected instead of the sample being brought to the microscope. Vacuum hardware requirements are minimized. The fabrication technology is inexpensive with respect to the conventional methods of electron microscope construction. Arrays of MSEMs can be built to allow applications in high throughput e-beam lithography. In addition two MSEMs can be mounted a few degrees apart to provide stereo imaging.",
author = "Crewe, {David A.} and Dung-Ching Perng and Shoaf, {S. E.} and Feinerman, {Alan D.}",
year = "1992",
month = "12",
day = "1",
language = "English",
isbn = "0819409502",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
publisher = "Publ by Int Soc for Optical Engineering",
pages = "66--77",
booktitle = "Proceedings of SPIE - The International Society for Optical Engineering",

}

Crewe, DA, Perng, D-C, Shoaf, SE & Feinerman, AD 1992, Micromachined electron source. in Proceedings of SPIE - The International Society for Optical Engineering. Proceedings of SPIE - The International Society for Optical Engineering, vol. 1778, Publ by Int Soc for Optical Engineering, pp. 66-77, Imaging Technologies and Applications, Chicago, IL, USA, 92-03-19.

Micromachined electron source. / Crewe, David A.; Perng, Dung-Ching; Shoaf, S. E.; Feinerman, Alan D.

Proceedings of SPIE - The International Society for Optical Engineering. Publ by Int Soc for Optical Engineering, 1992. p. 66-77 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 1778).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

TY - GEN

T1 - Micromachined electron source

AU - Crewe, David A.

AU - Perng, Dung-Ching

AU - Shoaf, S. E.

AU - Feinerman, Alan D.

PY - 1992/12/1

Y1 - 1992/12/1

N2 - A new microfabrication technique that allows the precise construction of large three dimensional structures with dimensional tolerances approaching 1 micron is being applied to the design of a miniature scanning electron microscope (MSEM). In this paper we present the electron optic calculations of the MSEM source (gun). The MSEM measures less than one cubic centimeter and the source measures approximately 1 × 1 × 0.20 cm3. The details of the MSEM fabrication are in an accompanying article. There are many advantages of a MSEM. The performance of an SEM is improved as its length is reduced. The need for mechanical adjustments and motion feedthroughs is eliminated since the microscope components are pre-aligned to the optic axis. All components are ultra high vacuum compatible and can be heated to 500°C. A small, portable electron microscope can be brought to the sample to be inspected instead of the sample being brought to the microscope. Vacuum hardware requirements are minimized. The fabrication technology is inexpensive with respect to the conventional methods of electron microscope construction. Arrays of MSEMs can be built to allow applications in high throughput e-beam lithography. In addition two MSEMs can be mounted a few degrees apart to provide stereo imaging.

AB - A new microfabrication technique that allows the precise construction of large three dimensional structures with dimensional tolerances approaching 1 micron is being applied to the design of a miniature scanning electron microscope (MSEM). In this paper we present the electron optic calculations of the MSEM source (gun). The MSEM measures less than one cubic centimeter and the source measures approximately 1 × 1 × 0.20 cm3. The details of the MSEM fabrication are in an accompanying article. There are many advantages of a MSEM. The performance of an SEM is improved as its length is reduced. The need for mechanical adjustments and motion feedthroughs is eliminated since the microscope components are pre-aligned to the optic axis. All components are ultra high vacuum compatible and can be heated to 500°C. A small, portable electron microscope can be brought to the sample to be inspected instead of the sample being brought to the microscope. Vacuum hardware requirements are minimized. The fabrication technology is inexpensive with respect to the conventional methods of electron microscope construction. Arrays of MSEMs can be built to allow applications in high throughput e-beam lithography. In addition two MSEMs can be mounted a few degrees apart to provide stereo imaging.

UR - http://www.scopus.com/inward/record.url?scp=0026990311&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0026990311&partnerID=8YFLogxK

M3 - Conference contribution

SN - 0819409502

T3 - Proceedings of SPIE - The International Society for Optical Engineering

SP - 66

EP - 77

BT - Proceedings of SPIE - The International Society for Optical Engineering

PB - Publ by Int Soc for Optical Engineering

ER -

Crewe DA, Perng D-C, Shoaf SE, Feinerman AD. Micromachined electron source. In Proceedings of SPIE - The International Society for Optical Engineering. Publ by Int Soc for Optical Engineering. 1992. p. 66-77. (Proceedings of SPIE - The International Society for Optical Engineering).