Microstructure and electrochemical properties of PVD TiN, (Ti, Al) N-coated Ti-based bulk metallic glasses

F. X. Qin; G. Q. Xie; X. M. Wang; T. Wada; M. Song; K. Furuya; M. Yoshimura; M. Tsukamoto; A. Inoue

doi:10.2320/matertrans.ME200820

Microstructure and electrochemical properties of PVD TiN, (Ti, Al) N-coated Ti-based bulk metallic glasses

F. X. Qin, G. Q. Xie, X. M. Wang, T. Wada, M. Song, K. Furuya, M. Yoshimura, M. Tsukamoto, A. Inoue

Department of Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

14 Citations (Scopus)

Abstract

In this study, the microstructure and electrochemical properties of PVD TiN and (Ti, Al) N coatings on Ti₄₀Zr₁₀Cu₃₆Pd ₁₄ bulk metallic glass were investigated. The microstructure of TiN or (Ti, Al) N coatings, the BMG substrate and the interface was investigated by highresolution transmission electron microscopy. The electrochemical behavior of PVD coatings on the Ti-based BMG was studied by measuring potentiodynamic polarization curves in Hanks' solution. HREM observation revealed that the sputtering TiN ((Ti, Al) N) coating consisted of cubic TiN ((Ti, Al) N) phase with a lattice parameter of 0.426 (0.422) nm in nanoscale. The polarization curves showed that the open circuit potential shifted to a more positive potential and the passive current density decreased due to the protective TiN or (Ti, Al) N coating.

Original language	English
Pages (from-to)	1313-1317
Number of pages	5
Journal	Materials Transactions
Volume	50
Issue number	6
DOIs	https://doi.org/10.2320/matertrans.ME200820
Publication status	Published - 2009 Jun

All Science Journal Classification (ASJC) codes

General Materials Science
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

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title = "Microstructure and electrochemical properties of PVD TiN, (Ti, Al) N-coated Ti-based bulk metallic glasses",

abstract = "In this study, the microstructure and electrochemical properties of PVD TiN and (Ti, Al) N coatings on Ti40Zr10Cu36Pd 14 bulk metallic glass were investigated. The microstructure of TiN or (Ti, Al) N coatings, the BMG substrate and the interface was investigated by highresolution transmission electron microscopy. The electrochemical behavior of PVD coatings on the Ti-based BMG was studied by measuring potentiodynamic polarization curves in Hanks' solution. HREM observation revealed that the sputtering TiN ((Ti, Al) N) coating consisted of cubic TiN ((Ti, Al) N) phase with a lattice parameter of 0.426 (0.422) nm in nanoscale. The polarization curves showed that the open circuit potential shifted to a more positive potential and the passive current density decreased due to the protective TiN or (Ti, Al) N coating.",

author = "Qin, {F. X.} and Xie, {G. Q.} and Wang, {X. M.} and T. Wada and M. Song and K. Furuya and M. Yoshimura and M. Tsukamoto and A. Inoue",

year = "2009",

month = jun,

doi = "10.2320/matertrans.ME200820",

language = "English",

volume = "50",

pages = "1313--1317",

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T1 - Microstructure and electrochemical properties of PVD TiN, (Ti, Al) N-coated Ti-based bulk metallic glasses

AU - Qin, F. X.

AU - Xie, G. Q.

AU - Wang, X. M.

AU - Wada, T.

AU - Song, M.

AU - Furuya, K.

AU - Yoshimura, M.

AU - Tsukamoto, M.

AU - Inoue, A.

PY - 2009/6

Y1 - 2009/6

N2 - In this study, the microstructure and electrochemical properties of PVD TiN and (Ti, Al) N coatings on Ti40Zr10Cu36Pd 14 bulk metallic glass were investigated. The microstructure of TiN or (Ti, Al) N coatings, the BMG substrate and the interface was investigated by highresolution transmission electron microscopy. The electrochemical behavior of PVD coatings on the Ti-based BMG was studied by measuring potentiodynamic polarization curves in Hanks' solution. HREM observation revealed that the sputtering TiN ((Ti, Al) N) coating consisted of cubic TiN ((Ti, Al) N) phase with a lattice parameter of 0.426 (0.422) nm in nanoscale. The polarization curves showed that the open circuit potential shifted to a more positive potential and the passive current density decreased due to the protective TiN or (Ti, Al) N coating.

AB - In this study, the microstructure and electrochemical properties of PVD TiN and (Ti, Al) N coatings on Ti40Zr10Cu36Pd 14 bulk metallic glass were investigated. The microstructure of TiN or (Ti, Al) N coatings, the BMG substrate and the interface was investigated by highresolution transmission electron microscopy. The electrochemical behavior of PVD coatings on the Ti-based BMG was studied by measuring potentiodynamic polarization curves in Hanks' solution. HREM observation revealed that the sputtering TiN ((Ti, Al) N) coating consisted of cubic TiN ((Ti, Al) N) phase with a lattice parameter of 0.426 (0.422) nm in nanoscale. The polarization curves showed that the open circuit potential shifted to a more positive potential and the passive current density decreased due to the protective TiN or (Ti, Al) N coating.

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JO - Materials Transactions

JF - Materials Transactions

IS - 6

ER -

Microstructure and electrochemical properties of PVD TiN, (Ti, Al) N-coated Ti-based bulk metallic glasses

Abstract

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