Miniature electron microscopes for lithography

Alan D. Feinerman; David A. Crewe; Dung Ching Perng; Capp A. Spindt; Paul R. Schwoebel; Albert V. Crewe

doi:10.1117/12.175812

Miniature electron microscopes for lithography

Alan D. Feinerman
, David A. Crewe
, Dung Ching Perng
, Capp A. Spindt
, Paul R. Schwoebel
, Albert V. Crewe

Department of Electrical Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

5 Citations (Scopus)

Abstract

Two inexpensive and extremely accurate methods for fabricating miniature 10 - 50 kV and 0.5 - 10 kV electron beam columns have been developed: `slicing,' and `stacking.' Two or three miniature columns could be used to perform a 20 nm or better alignment of an x-ray mask to a substrate. An array of miniature columns could be used for rapid wafer inspection and high throughput electron beam lithography. The column fabrication methods combine the precision of semiconductor processing and fiber optic technologies to create macroscopic structures consisting of charged particle sources, deflecting and focusing electrodes, and detectors. The overall performance of the miniature column also depends on the emission characteristics of the micromachined electron source which is currently being investigated.

Original language	English
Title of host publication	Proceedings of SPIE - The International Society for Optical Engineering
Publisher	Publ by Society of Photo-Optical Instrumentation Engineers
Pages	262-273
Number of pages	12
ISBN (Print)	0819414891, 9780819414892
DOIs	https://doi.org/10.1117/12.175812
Publication status	Published - 1994
Event	Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV - San Jose, CA, USA Duration: 1994 Feb 28 → 1994 Mar 1

Publication series

Name	Proceedings of SPIE - The International Society for Optical Engineering
Volume	2194
ISSN (Print)	0277-786X

Other

Other	Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV
City	San Jose, CA, USA
Period	94-02-28 → 94-03-01

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

SDG 9 Industry, Innovation, and Infrastructure

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

Access to Document

10.1117/12.175812

Cite this

Feinerman, A. D., Crewe, D. A., Perng, D. C., Spindt, C. A., Schwoebel, P. R., & Crewe, A. V. (1994). Miniature electron microscopes for lithography. In Proceedings of SPIE - The International Society for Optical Engineering (pp. 262-273). (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 2194). Publ by Society of Photo-Optical Instrumentation Engineers. https://doi.org/10.1117/12.175812

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title = "Miniature electron microscopes for lithography",

abstract = "Two inexpensive and extremely accurate methods for fabricating miniature 10 - 50 kV and 0.5 - 10 kV electron beam columns have been developed: `slicing,' and `stacking.' Two or three miniature columns could be used to perform a 20 nm or better alignment of an x-ray mask to a substrate. An array of miniature columns could be used for rapid wafer inspection and high throughput electron beam lithography. The column fabrication methods combine the precision of semiconductor processing and fiber optic technologies to create macroscopic structures consisting of charged particle sources, deflecting and focusing electrodes, and detectors. The overall performance of the miniature column also depends on the emission characteristics of the micromachined electron source which is currently being investigated.",

author = "Feinerman, \{Alan D.\} and Crewe, \{David A.\} and Perng, \{Dung Ching\} and Spindt, \{Capp A.\} and Schwoebel, \{Paul R.\} and Crewe, \{Albert V.\}",

year = "1994",

doi = "10.1117/12.175812",

language = "English",

isbn = "0819414891",

series = "Proceedings of SPIE - The International Society for Optical Engineering",

publisher = "Publ by Society of Photo-Optical Instrumentation Engineers",

pages = "262--273",

booktitle = "Proceedings of SPIE - The International Society for Optical Engineering",

note = "Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV ; Conference date: 28-02-1994 Through 01-03-1994",

}

Feinerman, AD, Crewe, DA, Perng, DC, Spindt, CA, Schwoebel, PR & Crewe, AV 1994, Miniature electron microscopes for lithography. in Proceedings of SPIE - The International Society for Optical Engineering. Proceedings of SPIE - The International Society for Optical Engineering, vol. 2194, Publ by Society of Photo-Optical Instrumentation Engineers, pp. 262-273, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV, San Jose, CA, USA, 94-02-28. https://doi.org/10.1117/12.175812

Miniature electron microscopes for lithography. / Feinerman, Alan D.; Crewe, David A.; Perng, Dung Ching et al.
Proceedings of SPIE - The International Society for Optical Engineering. Publ by Society of Photo-Optical Instrumentation Engineers, 1994. p. 262-273 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 2194).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

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AU - Feinerman, Alan D.

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AU - Crewe, Albert V.

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AB - Two inexpensive and extremely accurate methods for fabricating miniature 10 - 50 kV and 0.5 - 10 kV electron beam columns have been developed: `slicing,' and `stacking.' Two or three miniature columns could be used to perform a 20 nm or better alignment of an x-ray mask to a substrate. An array of miniature columns could be used for rapid wafer inspection and high throughput electron beam lithography. The column fabrication methods combine the precision of semiconductor processing and fiber optic technologies to create macroscopic structures consisting of charged particle sources, deflecting and focusing electrodes, and detectors. The overall performance of the miniature column also depends on the emission characteristics of the micromachined electron source which is currently being investigated.

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Y2 - 28 February 1994 through 1 March 1994

ER -

Miniature electron microscopes for lithography

Abstract

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