Modeling of dynamical processes in laser ablation

J. N. Leboeuf; K. R. Chen; J. M. Donato; D. B. Geohegan; C. L. Liu; A. A. Puretzky; R. F. Wood

doi:10.1016/0169-4332(95)00372-X

Modeling of dynamical processes in laser ablation

J. N. Leboeuf, K. R. Chen, J. M. Donato, D. B. Geohegan, C. L. Liu, A. A. Puretzky, R. F. Wood

Department of Physics

Research output: Contribution to journal › Article › peer-review

62 Citations (Scopus)

Abstract

Various physics and computational approaches have been developed to globally characterize phenomena important for film growth by pulsed-laser deposition of materials. These include thermal models of laser-solid target interactions that initiate the vapor plume, plume ionization and heating through laser absorption beyond local thermodynamic equilibrium mechanisms, hydrodynamic and collisional descriptions of plume transport, and molecular dynamics models of the interaction of plume particles with the deposition substrate.

Original language	English
Pages (from-to)	14-23
Number of pages	10
Journal	Applied Surface Science
Volume	96-98
DOIs	https://doi.org/10.1016/0169-4332(95)00372-X
Publication status	Published - 1996 Apr

All Science Journal Classification (ASJC) codes

Chemistry(all)
Condensed Matter Physics
Physics and Astronomy(all)
Surfaces and Interfaces
Surfaces, Coatings and Films

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title = "Modeling of dynamical processes in laser ablation",

abstract = "Various physics and computational approaches have been developed to globally characterize phenomena important for film growth by pulsed-laser deposition of materials. These include thermal models of laser-solid target interactions that initiate the vapor plume, plume ionization and heating through laser absorption beyond local thermodynamic equilibrium mechanisms, hydrodynamic and collisional descriptions of plume transport, and molecular dynamics models of the interaction of plume particles with the deposition substrate.",

author = "Leboeuf, {J. N.} and Chen, {K. R.} and Donato, {J. M.} and Geohegan, {D. B.} and Liu, {C. L.} and Puretzky, {A. A.} and Wood, {R. F.}",

note = "Funding Information: This research is sponsored at the Oak Ridge National Laboratory (ORNL) by Laboratory Directed Research and Development Funds and by the Division of Materials Sciences, U.S. Department of Energy, under contract DE-AC05840R21400 with Lockheed Martin Energy Systems, Inc. K.R. Chen and Chun-Li Liu are supported by an appointment to the ORNL Research Associate Program, administered jointly by the Oak Ridge Institute for Science and Education and ORNL. Alex Puretzky is on assignment to ORNL from the Institute of Spectroscopy, Russian Academy of Sciences, Troitsk, Russia.",

year = "1996",

month = apr,

doi = "10.1016/0169-4332(95)00372-X",

language = "English",

volume = "96-98",

pages = "14--23",

journal = "Applied Surface Science",

issn = "0169-4332",

publisher = "Elsevier",

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T1 - Modeling of dynamical processes in laser ablation

AU - Leboeuf, J. N.

AU - Chen, K. R.

AU - Donato, J. M.

AU - Geohegan, D. B.

AU - Liu, C. L.

AU - Puretzky, A. A.

AU - Wood, R. F.

N1 - Funding Information: This research is sponsored at the Oak Ridge National Laboratory (ORNL) by Laboratory Directed Research and Development Funds and by the Division of Materials Sciences, U.S. Department of Energy, under contract DE-AC05840R21400 with Lockheed Martin Energy Systems, Inc. K.R. Chen and Chun-Li Liu are supported by an appointment to the ORNL Research Associate Program, administered jointly by the Oak Ridge Institute for Science and Education and ORNL. Alex Puretzky is on assignment to ORNL from the Institute of Spectroscopy, Russian Academy of Sciences, Troitsk, Russia.

PY - 1996/4

Y1 - 1996/4

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AB - Various physics and computational approaches have been developed to globally characterize phenomena important for film growth by pulsed-laser deposition of materials. These include thermal models of laser-solid target interactions that initiate the vapor plume, plume ionization and heating through laser absorption beyond local thermodynamic equilibrium mechanisms, hydrodynamic and collisional descriptions of plume transport, and molecular dynamics models of the interaction of plume particles with the deposition substrate.

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