Modeling of thermal, electronic, hydrodynamic, and dynamic deposition processes for pulsed-laser deposition of thin films

C. L. Liu, J. N. Leboeuf, R. F. Wood, D. B. Geohegan, J. M. Donato, Kuan-Ren Chen, A. A. Puretzky

Research output: Contribution to journalConference article

1 Citation (Scopus)

Abstract

Various physical processes during laser ablation of solids for pulsed-laser deposition (PLD) are studied using a variety of computational techniques. In the course of our combined theoretical and experimental effort, we have been trying to work on as many aspects of PLD processes as possible, but with special focus on the following areas: (a) the effects of collisional interactions between the particles in the plume and in the background on the evolving flow field and on thin film growth, (b) interactions between the energetic particles and the growing thin films and their effects on film quality, (c) rapid phase transformations through the liquid and vapor phases under possibly nonequilibrium thermodynamic conditions induced by laser solid interactions, (d) breakdown of the vapor into a plasma in the early stages of ablation through both electronic and photoionization processes, (c) hydrodynamics behavior of the vapor/plasma during and after ablation. The computational techniques used include finite difference (FD) methods, particle-in-cell model, and atomistic simulations using molecular dynamics (MD) techniques.

Original languageEnglish
Pages (from-to)675-680
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Volume354
Publication statusPublished - 1995 Dec 1
EventProceedings of the 1994 MRS Fall Meeting - Boston, MA, USA
Duration: 1994 Nov 281994 Dec 2

Fingerprint

Pulsed laser deposition
pulsed laser deposition
Hydrodynamics
Vapors
hydrodynamics
Ablation
Thin films
ablation
thin films
electronics
vapors
Plasmas
Photoionization
nonequilibrium thermodynamics
Solid state lasers
interactions
Film growth
Laser ablation
energetic particles
Finite difference method

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

Liu, C. L. ; Leboeuf, J. N. ; Wood, R. F. ; Geohegan, D. B. ; Donato, J. M. ; Chen, Kuan-Ren ; Puretzky, A. A. / Modeling of thermal, electronic, hydrodynamic, and dynamic deposition processes for pulsed-laser deposition of thin films. In: Materials Research Society Symposium - Proceedings. 1995 ; Vol. 354. pp. 675-680.
@article{f08b02d5237941e29d68e03a3992b647,
title = "Modeling of thermal, electronic, hydrodynamic, and dynamic deposition processes for pulsed-laser deposition of thin films",
abstract = "Various physical processes during laser ablation of solids for pulsed-laser deposition (PLD) are studied using a variety of computational techniques. In the course of our combined theoretical and experimental effort, we have been trying to work on as many aspects of PLD processes as possible, but with special focus on the following areas: (a) the effects of collisional interactions between the particles in the plume and in the background on the evolving flow field and on thin film growth, (b) interactions between the energetic particles and the growing thin films and their effects on film quality, (c) rapid phase transformations through the liquid and vapor phases under possibly nonequilibrium thermodynamic conditions induced by laser solid interactions, (d) breakdown of the vapor into a plasma in the early stages of ablation through both electronic and photoionization processes, (c) hydrodynamics behavior of the vapor/plasma during and after ablation. The computational techniques used include finite difference (FD) methods, particle-in-cell model, and atomistic simulations using molecular dynamics (MD) techniques.",
author = "Liu, {C. L.} and Leboeuf, {J. N.} and Wood, {R. F.} and Geohegan, {D. B.} and Donato, {J. M.} and Kuan-Ren Chen and Puretzky, {A. A.}",
year = "1995",
month = "12",
day = "1",
language = "English",
volume = "354",
pages = "675--680",
journal = "Materials Research Society Symposium - Proceedings",
issn = "0272-9172",
publisher = "Materials Research Society",

}

Modeling of thermal, electronic, hydrodynamic, and dynamic deposition processes for pulsed-laser deposition of thin films. / Liu, C. L.; Leboeuf, J. N.; Wood, R. F.; Geohegan, D. B.; Donato, J. M.; Chen, Kuan-Ren; Puretzky, A. A.

In: Materials Research Society Symposium - Proceedings, Vol. 354, 01.12.1995, p. 675-680.

Research output: Contribution to journalConference article

TY - JOUR

T1 - Modeling of thermal, electronic, hydrodynamic, and dynamic deposition processes for pulsed-laser deposition of thin films

AU - Liu, C. L.

AU - Leboeuf, J. N.

AU - Wood, R. F.

AU - Geohegan, D. B.

AU - Donato, J. M.

AU - Chen, Kuan-Ren

AU - Puretzky, A. A.

PY - 1995/12/1

Y1 - 1995/12/1

N2 - Various physical processes during laser ablation of solids for pulsed-laser deposition (PLD) are studied using a variety of computational techniques. In the course of our combined theoretical and experimental effort, we have been trying to work on as many aspects of PLD processes as possible, but with special focus on the following areas: (a) the effects of collisional interactions between the particles in the plume and in the background on the evolving flow field and on thin film growth, (b) interactions between the energetic particles and the growing thin films and their effects on film quality, (c) rapid phase transformations through the liquid and vapor phases under possibly nonequilibrium thermodynamic conditions induced by laser solid interactions, (d) breakdown of the vapor into a plasma in the early stages of ablation through both electronic and photoionization processes, (c) hydrodynamics behavior of the vapor/plasma during and after ablation. The computational techniques used include finite difference (FD) methods, particle-in-cell model, and atomistic simulations using molecular dynamics (MD) techniques.

AB - Various physical processes during laser ablation of solids for pulsed-laser deposition (PLD) are studied using a variety of computational techniques. In the course of our combined theoretical and experimental effort, we have been trying to work on as many aspects of PLD processes as possible, but with special focus on the following areas: (a) the effects of collisional interactions between the particles in the plume and in the background on the evolving flow field and on thin film growth, (b) interactions between the energetic particles and the growing thin films and their effects on film quality, (c) rapid phase transformations through the liquid and vapor phases under possibly nonequilibrium thermodynamic conditions induced by laser solid interactions, (d) breakdown of the vapor into a plasma in the early stages of ablation through both electronic and photoionization processes, (c) hydrodynamics behavior of the vapor/plasma during and after ablation. The computational techniques used include finite difference (FD) methods, particle-in-cell model, and atomistic simulations using molecular dynamics (MD) techniques.

UR - http://www.scopus.com/inward/record.url?scp=0029522039&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0029522039&partnerID=8YFLogxK

M3 - Conference article

AN - SCOPUS:0029522039

VL - 354

SP - 675

EP - 680

JO - Materials Research Society Symposium - Proceedings

JF - Materials Research Society Symposium - Proceedings

SN - 0272-9172

ER -