Modification of aliphatic self-assembled monolayers by free-radical- dominant plasma: The role of the plasma composition

Chih Chiang Weng, Jiunn Der Liao, Yi Te Wu, Ming Chen Wang, Ruth Klauser, Michael Grunze, Michael Zharnikov

Research output: Contribution to journalArticlepeer-review

27 Citations (Scopus)

Abstract

Modification of octadecanethiolate self-assembled monolayers on Au by nitrogen-oxygen or argon-oxygen downstream microwave plasma with a low oxygen content (estimated below several percent) has been studied by synchrotron-based high-resolution X-ray photoelectron spectroscopy and water contact angle measurements. For both types of plasma, the primary processes were found to be the loss of conformational and orientational order and the oxidation of the alkyl matrix and headgroup-substrate interface. At the same time, the film modification occurred much faster and with different intermediates for the nitrogen plasma than for the argon plasma. The reasons for these differences are considered in terms of the different reactivities and different efficiencies of the energy transfer between the plasma constituents in these two types of plasma.

Original languageEnglish
Pages (from-to)10093-10099
Number of pages7
JournalLangmuir
Volume20
Issue number23
DOIs
Publication statusPublished - 2004 Nov 9

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Spectroscopy
  • Electrochemistry

Fingerprint Dive into the research topics of 'Modification of aliphatic self-assembled monolayers by free-radical- dominant plasma: The role of the plasma composition'. Together they form a unique fingerprint.

Cite this