Molecular dynamics simulation of copper reflow in the damascene process

Ming Horng Su, Chi Chuan Hwang, Jee Gong Chang, Shin Pon Ju

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)

Abstract

An investigation of copper reflow in the damascene process using molecular dynamics simulation is presented. A simulation of the deposition process, with an investigation into the growing mechanism of the deposited atoms within the trench, is also included as well. The simulation results confirm the importance of the heating duration in achieving a successful reflow process in which the trench becomes completely filled by the deposited atoms.

Original languageEnglish
Pages (from-to)1853-1865
Number of pages13
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume20
Issue number5
DOIs
Publication statusPublished - 2002 Sept

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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