Monitor and eliminate the circular defects in HDP-STI deposition through oxynitride/oxide composite liner

Jin Kun Lan, Ying Lang Wang, Chuan-Pu Liu, Wen-Shi Lee, Chyung Ay, Yi Lung Cheng, Shih Chieh Chang

Research output: Contribution to journalConference article

1 Citation (Scopus)

Abstract

This paper investigates the monitor and elimination methods for the circular defects in high-density-plasma shallow trench isolation (HDP-STI) deposition process. The optical measurement method can monitor the circular defects in early stage. When the thickness of silane-burst film exceeds 7.8 nm, the fit-error can alert the circular defects. The oxynitride/oxide composite liner can eliminate the circular defects. Besides this, the oxynitride/oxide composite liner can also improve the breakdown strength of the STI oxide. The breakdown strength of the STI oxide increases, respectively, 375 and 30% in the wafer center and edge. The uniformity of the STI breakdown strength was reduced from greater than 200% to less than 10% using the composite liner. The traditional N2O plasma treatment for stabilizing the oxynitride film is harmful in the HDP-STI process. The N2O plasma treatment shows the worst circular defect performance.

Original languageEnglish
Pages (from-to)645-650
Number of pages6
JournalThin Solid Films
Volume447-448
DOIs
Publication statusPublished - 2004 Jan 30
EventProceedings of the 30th International Conference on Metallurgie - San Diego, CA, United States
Duration: 2002 Apr 282002 May 2

Fingerprint

Plasma density
oxynitrides
linings
Oxides
plasma density
monitors
isolation
Defects
composite materials
oxides
defects
Composite materials
breakdown
Plasmas
Silanes
optical measurement
silanes
elimination
bursts
wafers

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

Cite this

Lan, Jin Kun ; Wang, Ying Lang ; Liu, Chuan-Pu ; Lee, Wen-Shi ; Ay, Chyung ; Cheng, Yi Lung ; Chang, Shih Chieh. / Monitor and eliminate the circular defects in HDP-STI deposition through oxynitride/oxide composite liner. In: Thin Solid Films. 2004 ; Vol. 447-448. pp. 645-650.
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title = "Monitor and eliminate the circular defects in HDP-STI deposition through oxynitride/oxide composite liner",
abstract = "This paper investigates the monitor and elimination methods for the circular defects in high-density-plasma shallow trench isolation (HDP-STI) deposition process. The optical measurement method can monitor the circular defects in early stage. When the thickness of silane-burst film exceeds 7.8 nm, the fit-error can alert the circular defects. The oxynitride/oxide composite liner can eliminate the circular defects. Besides this, the oxynitride/oxide composite liner can also improve the breakdown strength of the STI oxide. The breakdown strength of the STI oxide increases, respectively, 375 and 30{\%} in the wafer center and edge. The uniformity of the STI breakdown strength was reduced from greater than 200{\%} to less than 10{\%} using the composite liner. The traditional N2O plasma treatment for stabilizing the oxynitride film is harmful in the HDP-STI process. The N2O plasma treatment shows the worst circular defect performance.",
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Monitor and eliminate the circular defects in HDP-STI deposition through oxynitride/oxide composite liner. / Lan, Jin Kun; Wang, Ying Lang; Liu, Chuan-Pu; Lee, Wen-Shi; Ay, Chyung; Cheng, Yi Lung; Chang, Shih Chieh.

In: Thin Solid Films, Vol. 447-448, 30.01.2004, p. 645-650.

Research output: Contribution to journalConference article

TY - JOUR

T1 - Monitor and eliminate the circular defects in HDP-STI deposition through oxynitride/oxide composite liner

AU - Lan, Jin Kun

AU - Wang, Ying Lang

AU - Liu, Chuan-Pu

AU - Lee, Wen-Shi

AU - Ay, Chyung

AU - Cheng, Yi Lung

AU - Chang, Shih Chieh

PY - 2004/1/30

Y1 - 2004/1/30

N2 - This paper investigates the monitor and elimination methods for the circular defects in high-density-plasma shallow trench isolation (HDP-STI) deposition process. The optical measurement method can monitor the circular defects in early stage. When the thickness of silane-burst film exceeds 7.8 nm, the fit-error can alert the circular defects. The oxynitride/oxide composite liner can eliminate the circular defects. Besides this, the oxynitride/oxide composite liner can also improve the breakdown strength of the STI oxide. The breakdown strength of the STI oxide increases, respectively, 375 and 30% in the wafer center and edge. The uniformity of the STI breakdown strength was reduced from greater than 200% to less than 10% using the composite liner. The traditional N2O plasma treatment for stabilizing the oxynitride film is harmful in the HDP-STI process. The N2O plasma treatment shows the worst circular defect performance.

AB - This paper investigates the monitor and elimination methods for the circular defects in high-density-plasma shallow trench isolation (HDP-STI) deposition process. The optical measurement method can monitor the circular defects in early stage. When the thickness of silane-burst film exceeds 7.8 nm, the fit-error can alert the circular defects. The oxynitride/oxide composite liner can eliminate the circular defects. Besides this, the oxynitride/oxide composite liner can also improve the breakdown strength of the STI oxide. The breakdown strength of the STI oxide increases, respectively, 375 and 30% in the wafer center and edge. The uniformity of the STI breakdown strength was reduced from greater than 200% to less than 10% using the composite liner. The traditional N2O plasma treatment for stabilizing the oxynitride film is harmful in the HDP-STI process. The N2O plasma treatment shows the worst circular defect performance.

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