Continuous-time photoelectron spectroscopy (PES) and continuous-time core-level photon-stimulated desorption (PSD) spectroscopy were used to study the monochromatic soft X-ray-induced reactions of CCl 2F 2 molecules adsorbed on Si(111)-7 × 7 at 30 K (CCl 2F 2 dose = 2.0 × 10 14 molecules/cm 2, ∼ 0.75 monolayer) near the Si(2p) core level. Evolution of adsorbed CCl 2F 2 molecules was monitored by using continuous-time photoelectron spectroscopy at two photon energies of 98 and 120 eV to deduce the photolysis cross section as a function of energy. It was found that the photolysis cross sections for 98 and 120 eV photons are ∼1.4 × 10 - 18 and ∼ 8.0 × 10 - 18 cm 2, respectively. Sequential F + PSD spectra obtained by using continuous-time core-level photon-stimulated desorption spectroscopy in the photon energy range of 98-110 eV show the variation of their shapes with photon exposure and depict the formation of surface SiF species. The dissociation of CCl 2F 2 molecules adsorbed on Si(111)-7 × 7, irradiated by monochromatic soft X-ray in the photon energy range of 98-110 eV, is mainly due to dissociative electron attachment and indirect dipolar dissociation induced by photoelectrons emitted from the silicon surface.
All Science Journal Classification (ASJC) codes
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Materials Chemistry