Monochromatic soft X-ray-induced reactions of CCl 2F 2 adsorbed on Si(111)-7 × 7 near the Si(2p) edge

S. K. Wang; W. C. Tsai; L. C. Chou; J. Chen; Y. H. Wu; T. M. He; K. S. Feng; C. R. Wen

doi:10.1016/j.susc.2012.03.001

Monochromatic soft X-ray-induced reactions of CCl ₂F ₂ adsorbed on Si(111)-7 × 7 near the Si(2p) edge

S. K. Wang
, W. C. Tsai
, L. C. Chou
, J. Chen
, Y. H. Wu
, T. M. He
, K. S. Feng
, C. R. Wen

Department of Physics

Research output: Contribution to journal › Article › peer-review

2 Citations (Scopus)

Abstract

Continuous-time photoelectron spectroscopy (PES) and continuous-time core-level photon-stimulated desorption (PSD) spectroscopy were used to study the monochromatic soft X-ray-induced reactions of CCl ₂F ₂ molecules adsorbed on Si(111)-7 × 7 at 30 K (CCl ₂F ₂ dose = 2.0 × 10 ¹⁴ molecules/cm ², ∼ 0.75 monolayer) near the Si(2p) core level. Evolution of adsorbed CCl ₂F ₂ molecules was monitored by using continuous-time photoelectron spectroscopy at two photon energies of 98 and 120 eV to deduce the photolysis cross section as a function of energy. It was found that the photolysis cross sections for 98 and 120 eV photons are _∼1.4 × 10 ^{- 18} and ∼ 8.0 × 10 ^{- 18} cm ², respectively. Sequential F ⁺ PSD spectra obtained by using continuous-time core-level photon-stimulated desorption spectroscopy in the photon energy range of 98-110 eV show the variation of their shapes with photon exposure and depict the formation of surface SiF species. The dissociation of CCl ₂F ₂ molecules adsorbed on Si(111)-7 × 7, irradiated by monochromatic soft X-ray in the photon energy range of 98-110 eV, is mainly due to dissociative electron attachment and indirect dipolar dissociation induced by photoelectrons emitted from the silicon surface.

Original language	English
Pages (from-to)	1062-1070
Number of pages	9
Journal	Surface Science
Volume	606
Issue number	13-14
DOIs	https://doi.org/10.1016/j.susc.2012.03.001
Publication status	Published - 2012 Jul

All Science Journal Classification (ASJC) codes

Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films
Materials Chemistry

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10.1016/j.susc.2012.03.001

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@article{ed7a967e81994696a9d80fd13ce3cf39,

title = "Monochromatic soft X-ray-induced reactions of CCl 2F 2 adsorbed on Si(111)-7 × 7 near the Si(2p) edge",

abstract = "Continuous-time photoelectron spectroscopy (PES) and continuous-time core-level photon-stimulated desorption (PSD) spectroscopy were used to study the monochromatic soft X-ray-induced reactions of CCl 2F 2 molecules adsorbed on Si(111)-7 × 7 at 30 K (CCl 2F 2 dose = 2.0 × 10 14 molecules/cm 2, ∼ 0.75 monolayer) near the Si(2p) core level. Evolution of adsorbed CCl 2F 2 molecules was monitored by using continuous-time photoelectron spectroscopy at two photon energies of 98 and 120 eV to deduce the photolysis cross section as a function of energy. It was found that the photolysis cross sections for 98 and 120 eV photons are ∼1.4 × 10 - 18 and ∼ 8.0 × 10 - 18 cm 2, respectively. Sequential F + PSD spectra obtained by using continuous-time core-level photon-stimulated desorption spectroscopy in the photon energy range of 98-110 eV show the variation of their shapes with photon exposure and depict the formation of surface SiF species. The dissociation of CCl 2F 2 molecules adsorbed on Si(111)-7 × 7, irradiated by monochromatic soft X-ray in the photon energy range of 98-110 eV, is mainly due to dissociative electron attachment and indirect dipolar dissociation induced by photoelectrons emitted from the silicon surface.",

author = "Wang, \{S. K.\} and Tsai, \{W. C.\} and Chou, \{L. C.\} and J. Chen and Wu, \{Y. H.\} and He, \{T. M.\} and Feng, \{K. S.\} and Wen, \{C. R.\}",

note = "Funding Information: This work was performed at the National Synchrotron Radiation Research Center (NSRRC) , Hsinchu, Taiwan. We would like to thank all members at NSRRC for their technical support. Financial support by the National Science Council of Taiwan through Project No. NSC 97-2112-M-006-011-MY3 is gratefully acknowledged.",

year = "2012",

month = jul,

doi = "10.1016/j.susc.2012.03.001",

language = "English",

volume = "606",

pages = "1062--1070",

journal = "Surface Science",

issn = "0039-6028",

publisher = "Elsevier BV",

number = "13-14",

}

TY - JOUR

T1 - Monochromatic soft X-ray-induced reactions of CCl 2F 2 adsorbed on Si(111)-7 × 7 near the Si(2p) edge

AU - Wang, S. K.

AU - Tsai, W. C.

AU - Chou, L. C.

AU - Chen, J.

AU - Wu, Y. H.

AU - He, T. M.

AU - Feng, K. S.

AU - Wen, C. R.

N1 - Funding Information: This work was performed at the National Synchrotron Radiation Research Center (NSRRC) , Hsinchu, Taiwan. We would like to thank all members at NSRRC for their technical support. Financial support by the National Science Council of Taiwan through Project No. NSC 97-2112-M-006-011-MY3 is gratefully acknowledged.

PY - 2012/7

Y1 - 2012/7

N2 - Continuous-time photoelectron spectroscopy (PES) and continuous-time core-level photon-stimulated desorption (PSD) spectroscopy were used to study the monochromatic soft X-ray-induced reactions of CCl 2F 2 molecules adsorbed on Si(111)-7 × 7 at 30 K (CCl 2F 2 dose = 2.0 × 10 14 molecules/cm 2, ∼ 0.75 monolayer) near the Si(2p) core level. Evolution of adsorbed CCl 2F 2 molecules was monitored by using continuous-time photoelectron spectroscopy at two photon energies of 98 and 120 eV to deduce the photolysis cross section as a function of energy. It was found that the photolysis cross sections for 98 and 120 eV photons are ∼1.4 × 10 - 18 and ∼ 8.0 × 10 - 18 cm 2, respectively. Sequential F + PSD spectra obtained by using continuous-time core-level photon-stimulated desorption spectroscopy in the photon energy range of 98-110 eV show the variation of their shapes with photon exposure and depict the formation of surface SiF species. The dissociation of CCl 2F 2 molecules adsorbed on Si(111)-7 × 7, irradiated by monochromatic soft X-ray in the photon energy range of 98-110 eV, is mainly due to dissociative electron attachment and indirect dipolar dissociation induced by photoelectrons emitted from the silicon surface.

AB - Continuous-time photoelectron spectroscopy (PES) and continuous-time core-level photon-stimulated desorption (PSD) spectroscopy were used to study the monochromatic soft X-ray-induced reactions of CCl 2F 2 molecules adsorbed on Si(111)-7 × 7 at 30 K (CCl 2F 2 dose = 2.0 × 10 14 molecules/cm 2, ∼ 0.75 monolayer) near the Si(2p) core level. Evolution of adsorbed CCl 2F 2 molecules was monitored by using continuous-time photoelectron spectroscopy at two photon energies of 98 and 120 eV to deduce the photolysis cross section as a function of energy. It was found that the photolysis cross sections for 98 and 120 eV photons are ∼1.4 × 10 - 18 and ∼ 8.0 × 10 - 18 cm 2, respectively. Sequential F + PSD spectra obtained by using continuous-time core-level photon-stimulated desorption spectroscopy in the photon energy range of 98-110 eV show the variation of their shapes with photon exposure and depict the formation of surface SiF species. The dissociation of CCl 2F 2 molecules adsorbed on Si(111)-7 × 7, irradiated by monochromatic soft X-ray in the photon energy range of 98-110 eV, is mainly due to dissociative electron attachment and indirect dipolar dissociation induced by photoelectrons emitted from the silicon surface.

UR - https://www.scopus.com/pages/publications/84860704710

UR - https://www.scopus.com/pages/publications/84860704710#tab=citedBy

U2 - 10.1016/j.susc.2012.03.001

DO - 10.1016/j.susc.2012.03.001

M3 - Article

AN - SCOPUS:84860704710

SN - 0039-6028

VL - 606

SP - 1062

EP - 1070

JO - Surface Science

JF - Surface Science

IS - 13-14

ER -

Monochromatic soft X-ray-induced reactions of CCl ₂F ₂ adsorbed on Si(111)-7 × 7 near the Si(2p) edge

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