Morphological defects on Be-doped AlGaAs layers grown by MBE

Wen Chau Liu, Der Feng Guo, Chung Yih Sun, Wen Shiung Lour

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)

Abstract

The primary surface morphology, oval defects, of MBE-grown Be-doped AlGaAs layers has been studied using two different As partial pressure control methods, i.e., thermocouple (TC) and nude ion gauge (NIG) methods. The observed defect density has been studied as a systematic function of growth parameters, including doping concentration, substrate temperature, growth rate, epilayer thickness, and As partial pressure. The protrusion-induced oval defects were formed during MBE growth. The primary origin of the oval defects generated in our system is believed to be the presence of non-volatile III2O3 oxide. However, an oval defect density less than 600 cm-2 has been obtained through optimization of the growth parameters, and after paying careful attention to substrate preparation and vacuum conditions.

Original languageEnglish
Pages (from-to)700-706
Number of pages7
JournalJournal of Crystal Growth
Volume114
Issue number4
DOIs
Publication statusPublished - 1991 Dec 1

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Inorganic Chemistry
  • Materials Chemistry

Fingerprint Dive into the research topics of 'Morphological defects on Be-doped AlGaAs layers grown by MBE'. Together they form a unique fingerprint.

Cite this