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N-Type Low-Temperature Polycrystalline Silicon and Amorphous Oxide Thin-Film Transistor-Based Robust Dual-Output Gate Driver

  • Chih Lung Lin
  • , Chung Tien Chiu
  • , Li Wei Shih
  • , Yi Chien Chen
  • , Chia Ling Tsai
  • , De Lin Shih
  • , Po Cheng Lai

Research output: Contribution to journalArticlepeer-review

Abstract

This work presents a dual-output gate driver that is based on low-temperature polycrystalline silicon and amorphous oxide (LTPO) thin-film transistors (TFTs) and supports bidirectional transmission. This gate driver generates positive and negative pulses for both n-type and p-type switching TFTs in display pixels, effectively reducing the bezel area. Simulation results indicate that the output waveforms remain undistorted even when the threshold voltage (VTH) of low-temperature polycrystalline silicon (LTPS) TFTs varies by ±0.46 V and the VTH of the amorphous indium gallium zinc oxide (a-IGZO) TFTs shifts by +0.56 V. This gate driver achieves short rising/falling times of approximately 1.25/1.42μs for a positive pulse and 1.55/2.73μs for a negative pulse through the output circuit composed of LTPS TFTs during forward transmissions. When operated at 1 Hz, the output waveforms are correctly generated and stabilized at +6.6 V and -6.6 by the stabilization circuit, which includes a-IGZO TFTs. Therefore, the proposed gate driver is promising for use in low-frame-rate smartwatch displays.

Original languageEnglish
Pages (from-to)6769-6773
Number of pages5
JournalIEEE Transactions on Electron Devices
Volume71
Issue number11
DOIs
Publication statusPublished - 2024

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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