TY - GEN
T1 - Nano-patterned AlGaInP light-emitting diode based on UV-kiss metal transfer technology
AU - Hsieh, Yi Ta
AU - Chen, Chun Hung
AU - Lee, Yung Chun
AU - Zeng, Xu Feng
AU - Shei, Shih Chang
AU - Lin, Hung Yi
PY - 2010
Y1 - 2010
N2 - This paper describes a new nano-patterning technique, the UV-Kiss Metal Transfer (UV-KMT) method, and applies it for patterning micro/nano-structures on AlGaInP light-emitting diodes (LEDs) for enhancing their light extraction efficiency. First of all, an ETFE mold with micro/nano-features is replicated from a silicon master mold. A thin metal film is then deposited on the ETFE mold which has very low surface energy. A layer of UV curable polymer solution is spin-coated on an AlGaInP LED surface. The metal-film coated EFTE mold and the UV-polymer coated LED are brought into contact with a uniformly distributed pressure of 0.1 MPa, and UV light is radiated through the ETFE mold and solidifies the UV polymer. The solidified UV polymer has stronger adhesion to the metal film in contact with, and therefore can transfer the metal pattern defined by the convex surface feature of the ETFE mold onto the AlGaInP LED surface. The transferred metal pattern is then serving as an etching mask for RIE etching on the underlying UV polymer layer. Finally, a patterned structure consisting of a metal film on top and an underlying UV polymer layer is formed on the LED surface. This metal/polymer surface structure can well serve as an etching mask again for ICP etching on the LED, and hence complete the fabrication of micro/nano-structures on the top surfaces of AlGaInP LEDs for enhancing their light extraction efficiency. The optical power measurement using an integrating sphere shows that the extraction efficiency of the patterned LED is 25% higher than that of the conventional LED. In short, we demonstrate an easily implemented, cost effective, and powerful method to pattern LED substrate.
AB - This paper describes a new nano-patterning technique, the UV-Kiss Metal Transfer (UV-KMT) method, and applies it for patterning micro/nano-structures on AlGaInP light-emitting diodes (LEDs) for enhancing their light extraction efficiency. First of all, an ETFE mold with micro/nano-features is replicated from a silicon master mold. A thin metal film is then deposited on the ETFE mold which has very low surface energy. A layer of UV curable polymer solution is spin-coated on an AlGaInP LED surface. The metal-film coated EFTE mold and the UV-polymer coated LED are brought into contact with a uniformly distributed pressure of 0.1 MPa, and UV light is radiated through the ETFE mold and solidifies the UV polymer. The solidified UV polymer has stronger adhesion to the metal film in contact with, and therefore can transfer the metal pattern defined by the convex surface feature of the ETFE mold onto the AlGaInP LED surface. The transferred metal pattern is then serving as an etching mask for RIE etching on the underlying UV polymer layer. Finally, a patterned structure consisting of a metal film on top and an underlying UV polymer layer is formed on the LED surface. This metal/polymer surface structure can well serve as an etching mask again for ICP etching on the LED, and hence complete the fabrication of micro/nano-structures on the top surfaces of AlGaInP LEDs for enhancing their light extraction efficiency. The optical power measurement using an integrating sphere shows that the extraction efficiency of the patterned LED is 25% higher than that of the conventional LED. In short, we demonstrate an easily implemented, cost effective, and powerful method to pattern LED substrate.
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U2 - 10.1109/NEMS.2010.5592117
DO - 10.1109/NEMS.2010.5592117
M3 - Conference contribution
AN - SCOPUS:78649306772
SN - 9781424465439
T3 - 2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010
SP - 915
EP - 918
BT - 2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010
T2 - 5th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010
Y2 - 20 January 2010 through 23 January 2010
ER -