Nanoimprint mold manufacturing with focused ion beam

S. S.Max Chung, B. R. Huang, M. H. Weng, C. S. Fu, Y. Y. Chang, E. L. Chou, S. W. Lai, J. M. Chiou, Y. C. Chen, Yon-Hua Tzeng

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Nanoimprint lithography (NIL) is an emerging low cost technique for reproducing sub-45 nm pattern in various applications; however, manufacturing the mold for nanoimprint has been a key challenge in expense and resolution. Focused Ion Beams (FIB) has been known for high resolution but low throughput work in TEM sample preparation, and its extremely well defined 7 nm diameter Ga+ beam make it also a suitable tool for mold manufacturing for nanoimprint, which enable mass reproduction of the FIB work. We find features down to 30 nm can be made with FIB, the actual line width to beam diameter ratio is around 5-6 for an aspect ratio less than 2. A higher than 2 aspect ratio may result in re-deposition of the milled out substrate. Re-deposition can be reduced by a shorter dwell time or gas-assisted etching. There is a trade off between dwell time and feature integrity. Best results can be achieved with high hardness materials; the lack of conductivity for some materials can be remedied with s thin layer of Pt coating on the surface before FIB jobs.

Original languageEnglish
Title of host publication2007 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2007, Technical Proceedings
Pages446-449
Number of pages4
Publication statusPublished - 2007 Aug 23
Event2007 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2007 - Santa Clara, CA, United States
Duration: 2007 May 202007 May 24

Publication series

Name2007 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2007, Technical Proceedings
Volume4

Other

Other2007 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2007
CountryUnited States
CitySanta Clara, CA
Period07-05-2007-05-24

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All Science Journal Classification (ASJC) codes

  • Mechanical Engineering

Cite this

Chung, S. S. M., Huang, B. R., Weng, M. H., Fu, C. S., Chang, Y. Y., Chou, E. L., ... Tzeng, Y-H. (2007). Nanoimprint mold manufacturing with focused ion beam. In 2007 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2007, Technical Proceedings (pp. 446-449). (2007 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2007, Technical Proceedings; Vol. 4).