Nanoindentation response and microstructure of single-crystal silicon under different loads

Woei Shyan Lee, Tao Hsing Chen, Shuo Ling Chang

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Nanoindentation tests are performed on single-crystal silicon wafers using a Berkovich indenter and maximum indentation loads of 30 mN, 40 mN, and 70 mN, respectively. The microstructural evolutions of the indented specimens are examined using transmission electron microscopy and selected area diffraction techniques. The results show that the unloading curve of the specimen indented to a maximum load of 30 mN has a smooth profile, whereas those of the specimens indented to 40 mN or 70 mN have a pop-out feature. The hardness and Young's modulus of the silicon specimens reduce with an increasing indentation load, and have values of 15.8 GPa and 182 GPa, respectively, under the highest indentation load of 70 mN. A completely amorphous phase is induced within the indentation zone in the specimen indented to a maximum load of 30 mN, whereas a mixed structure comprising amorphous phase and nanocrystalline phase is found in the indentation zones in the specimens loaded to 40 mN and 70 mN, respectively.

Original languageEnglish
Title of host publication2009 IEEE 3rd International Conference on Nano/Molecular Medicine and Engineering, NANOMED 2009
Pages164-167
Number of pages4
DOIs
Publication statusPublished - 2009 Dec 1
Event2009 IEEE 3rd International Conference on Nano/Molecular Medicine and Engineering, NANOMED 2009 - Tainan, Taiwan
Duration: 2009 Oct 182009 Oct 21

Publication series

Name2009 IEEE 3rd International Conference on Nano/Molecular Medicine and Engineering, NANOMED 2009

Other

Other2009 IEEE 3rd International Conference on Nano/Molecular Medicine and Engineering, NANOMED 2009
Country/TerritoryTaiwan
CityTainan
Period09-10-1809-10-21

All Science Journal Classification (ASJC) codes

  • Molecular Medicine
  • Pharmacology

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