Nanoindentation response of zinc titanate thin films deposited by co-sputtering process

Shyh Chi Wu, Yeau-Ren Jeng, Wei Hung Yau, Kuan Te Wu, Chien Huang Tsai, Chang Pin Chou

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

In this study, ZnTiO 3 films were grown by radio frequency magnetron co-sputtering using a sintered ceramic target on silicon substrates, we used nanoindenter techniques under a CSM mode to evaluate the hardness (H) and elastic modulus (E) of the films after annealing in temperature range of 520-820 °C. The measured values of hardness and elastic moduli of the ZnTiO 3 films were in the range from 8.5 ± 0.4 to 5.6 ± 0.4 GPa and from 171 ± 2.3 to 155 ± 2.5 GPa, respectively. It is evident that an increase in the roughness due to high annealing temperature using atomic force microscopy. The XRD patterns were observed that as-deposited films are mainly amorphous, however, the hexagonal ZnTiO 3 phase was observed with the ZnTiO 3 (1 0 4), (1 1 0), (1 1 6), and (2 1 4) peaks from 620 to 820 °C, indicating that there is highly (1 0 4)-oriented ZnTiO 3 on the silicon substrate. The X-ray photoelectron spectroscopy core level analysis of the ZnTiO 3 films have been measured for O 1s that can be attributed the weaker bonds and lower resistance at the film based on the higher annealed temperature. The H, M, R ms , and R a were altered due to the grain growth and recovery to result in a relax crystallinity at ZnTiO 3 films.

Original languageEnglish
Pages (from-to)6730-6734
Number of pages5
JournalApplied Surface Science
Volume258
Issue number18
DOIs
Publication statusPublished - 2012 Jul 1

Fingerprint

Nanoindentation
nanoindentation
Sputtering
Zinc
zinc
sputtering
Thin films
thin films
Silicon
modulus of elasticity
hardness
Elastic moduli
command service modules
Hardness
Annealing
annealing
Core levels
low resistance
silicon
Substrates

All Science Journal Classification (ASJC) codes

  • Surfaces, Coatings and Films

Cite this

Wu, Shyh Chi ; Jeng, Yeau-Ren ; Yau, Wei Hung ; Wu, Kuan Te ; Tsai, Chien Huang ; Chou, Chang Pin. / Nanoindentation response of zinc titanate thin films deposited by co-sputtering process. In: Applied Surface Science. 2012 ; Vol. 258, No. 18. pp. 6730-6734.
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Nanoindentation response of zinc titanate thin films deposited by co-sputtering process. / Wu, Shyh Chi; Jeng, Yeau-Ren; Yau, Wei Hung; Wu, Kuan Te; Tsai, Chien Huang; Chou, Chang Pin.

In: Applied Surface Science, Vol. 258, No. 18, 01.07.2012, p. 6730-6734.

Research output: Contribution to journalArticle

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AU - Jeng, Yeau-Ren

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